“…In other words, the tunneling process occurs at the source/source-pocket interface, the tunneling rate of the carrier between the source and the source-pocket can be significantly improved by a thin pocket layer under the source region. In addition, heterojunction VTFETs have better performance than homojunction VTFETs [ 25 , 26 ]. According to the principle of band-to-band tunneling, small m*, small Eg, and appropriate ΔΦ are required in the source region (where m* is the effective carrier mass, Eg is the bandgap, and ΔΦ is the energy range over which tunneling can take place), and III-V material heterojunction is selected to form a heterostructure at the source/source-pocket interface in this simulation due to their suitable material performance and high electron mobility [ 27 , 28 , 29 , 30 , 31 , 32 , 33 , 34 ].…”