2019
DOI: 10.1109/jeds.2019.2925402
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Efficient Atomistic Simulation of Heterostructure Field-Effect Transistors

Abstract: In this paper, atomistic-level quantum mechanical simulations are performed for nanoscale field-effect transistors (FETs) with lateral or vertical heterojunction, within the non-equilibrium Green's function formalism. For efficient simulation of such heterostructure FETs, a novel approach is developed where the Green's functions are calculated by complementarily using the two algorithms of the recursive Green's function and the R-matrix. The R-matrix algorithm is extended to seamlessly combine the two methods … Show more

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Cited by 8 publications
(3 citation statements)
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“…Ahn et al introduced an advanced NEGF simulation approach to reduce the computational burden of atomisticlevel simulations of FETs [344]. The approach is based on using the R-matrix (for details on the R-matrix method see [345]) and recursive Green's function method and was evaluated considering a germanane/InSe vertical tunneling FET.…”
Section: Tunneling Fetsmentioning
confidence: 99%
“…Ahn et al introduced an advanced NEGF simulation approach to reduce the computational burden of atomisticlevel simulations of FETs [344]. The approach is based on using the R-matrix (for details on the R-matrix method see [345]) and recursive Green's function method and was evaluated considering a germanane/InSe vertical tunneling FET.…”
Section: Tunneling Fetsmentioning
confidence: 99%
“…In other words, the tunneling process occurs at the source/source-pocket interface, the tunneling rate of the carrier between the source and the source-pocket can be significantly improved by a thin pocket layer under the source region. In addition, heterojunction VTFETs have better performance than homojunction VTFETs [ 25 , 26 ]. According to the principle of band-to-band tunneling, small m*, small Eg, and appropriate ΔΦ are required in the source region (where m* is the effective carrier mass, Eg is the bandgap, and ΔΦ is the energy range over which tunneling can take place), and III-V material heterojunction is selected to form a heterostructure at the source/source-pocket interface in this simulation due to their suitable material performance and high electron mobility [ 27 , 28 , 29 , 30 , 31 , 32 , 33 , 34 ].…”
Section: Introductionmentioning
confidence: 99%
“…DFT Hamiltonians have found increasing use in the nanoelectronics simulations recently. Si nanowire FETs 5,6 and ultra-thin-body FETs, 6 2D material FETs, [7][8][9][10] and resistive memory devices 11 were simulated by importing LCAO DFT Hamiltonians, where LCAO is an abbreviation for linear combinations of atomic orbitals. Si nanowire transistors were also simulated by using the Hamiltonian from the real-space DFT method.…”
Section: Introductionmentioning
confidence: 99%