2017
DOI: 10.1016/j.mssp.2016.09.032
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Efficient light trapping nanopyramid structures for solar cells patterned using UV nanoimprint lithography

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Cited by 58 publications
(40 citation statements)
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“…Han et al [18] laminated PVC-textured films to the smooth surface of crystalline silicon cells using the hot embossing method, which reduced the reflection loss of the crystalline silicon cells from 30% to approximately 15%. Amalathas et al [19] fabricated a regular inverted pyramidal textured film onto the smooth surface of the crystalline silicon cells at the nanoscale using the ultraviolet (UV) imprinting embossing technique, which lowered the reflection loss of the smooth surface crystalline silicon cells to approximately 14%.…”
Section: Of 11mentioning
confidence: 99%
“…Han et al [18] laminated PVC-textured films to the smooth surface of crystalline silicon cells using the hot embossing method, which reduced the reflection loss of the crystalline silicon cells from 30% to approximately 15%. Amalathas et al [19] fabricated a regular inverted pyramidal textured film onto the smooth surface of the crystalline silicon cells at the nanoscale using the ultraviolet (UV) imprinting embossing technique, which lowered the reflection loss of the smooth surface crystalline silicon cells to approximately 14%.…”
Section: Of 11mentioning
confidence: 99%
“…More details of the UV nanoimprint process parameters and the tools which were used are described in Ref. [11].…”
Section: Surface Wettability and Self-cleaning Behaviorsmentioning
confidence: 99%
“…Nanostructures can be fabricated by various techniques, including electron beam lithography (EBL) [7], laser interference lithography (LIL) [8,9], nanoimprint lithography (NIL) [10,11], nanosphere lithography (NSL) [12] and block copolymer lithography (BCPL) [13]. Among them, the UV nanoimprint lithography (UV-NIL) is emerging as a powerful technique for fabricating nanoscale structures on large scale surfaces with simple, high-throughput, low-cost and high-resolution manufacturing capability [14].…”
Section: Introductionmentioning
confidence: 99%
“…A variety of photonic nanostructures [7] have been extensively studied. Especially, the micro-pyramid structure has been proved to be one of the most effective anti-reflective textures [8][9][10]. The pyramid structures can increase the optical path length by factors as high as 40 and have been experimentally demonstrated to be one of the most efficient light-trapping structures [11,12].…”
Section: Introductionmentioning
confidence: 99%
“…However, the pyramid structure cannot be well prepared by these above methods. Previous studies have already shown many alternative approaches [8,13,14] and nano-imprint lithography (NIL) has proved to be more appropriate for processing the large-area surface texture [15][16][17][18][19][20]. Meanwhile, wet etching of absorbing materials (such as silicon) is widely used in the fabrication of the micro-pyramid structure by combining with the NIL technique [15,21].…”
Section: Introductionmentioning
confidence: 99%