Efficient stripping of photoresist on metallized wafers by a pause flow of supercritical fluid

Chao, Mu‐Rong; Chen, Jian‐Lian

doi:10.1016/j.jhazmat.2009.03.092

Cited by 6 publications

(6 citation statements)

References 18 publications

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“…Chao et al found that the pulse flow mode of scCO 2 containing ethyl acetate co-solvent could strip polymethylstyrene derivatives type photoresists (YSB 663) better and 94.6% removing efficiency of 600 nm PR spin-coated on 500 nm Cu were obtained at the optimum conditions of 120 • C, oven temperature; 350 atm, CO 2 pressure; 0.2 mL of ethylacetate spiking to scCO 2 ; 2.0 min, static equilibrium time; and five cycles of dynamic flow pausing. 22 Herein we have demonstrated the stripping behavior of HDI PR in scCO 2 microemulsions containing surfactant EH-3 or TMN-3 with DMSO or IPA as a co-solvent. The surface morphology and photoresist stripping efficiency were evaluated by combining the optical microscopy, scanning electron microscope (SEM), Fourier transform infrared spectroscopy (FT-IR), and X-ray photoelectron spectroscopy (XPS).…”

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confidence: 84%

“…et al found that the pulse flow mode of scCO 2 containing ethyl acetate co-solvent could strip polymethylstyrene derivatives type photoresists (YSB 663) better and 94.6% removing efficiency of 600 nm PR spin-coated on 500 nm Cu were obtained at the optimum conditions of 120 • C, oven temperature; 350 atm, CO 2 pressure; 0.2 mL of ethylacetate spiking to scCO 2 ; 2.0 min, static equilibrium time; and five cycles of dynamic flow pausing 22. …”

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confidence: 99%

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The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO₂Formulations

Han

Wang

et al. 2013

ECS J. Solid State Sci. Technol.

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A new type of high-dose ion-implanted photoresist (HDI PR) stripping method was reported based on supercritical CO 2 (scCO 2 ) microemulsions consisting of branched hydrocarbon surfactant 2-ethyl hexanol polyoxyethylene-polyoxypropylene (EH-3) and co-solvent dimethylsulfoxide (DMSO). The optimized concentration of EH-3 and DMSO in scCO 2 were 3 wt% and 2 vol.%, respectively, and the ratio of H 2 O and EH-3 is 1:1. The post-etch HDI PRs containing crust polymer were removed in the scCO 2 microemulsions under the pressure of 10-25 MPa at 40-80 • C for 10 min. The results revealed that the stripping efficiency increased with the pressure and temperature when the temperature is lower than 60 • C. The 94% removal efficiency was achieved at 60 • C and 20 MPa and then it gradually decreased as the temperature is higher than 60 • C due to the lower scCO 2 density at higher temperature. The magnetic agitation and pressure pulsation were favorable to HDI PR removal. The optimum stripping parameters were determined to be 60 • C and 25 MPa for 20 min at which 100% photoresist removal efficiency was achieved in EH-3/DMSO/scCO 2 microemulsions. This environmentally benign method provides a promising alternative to effectively strip the HDI PR for nano-sized devices in microelectronics processing.The complete and effective stripping of high-dose ion-implanted photoresist (HDI PR) in IC manufacturing has become more challenging as the level of photoresist has increased while the allowable material loss and surface damage has decreased with the chip size downscaling. The heavily implanted photoresist is extremely difficult to be removed because an amorphous carbonized crust is formed due to the reaction of the implanted cation with the photoresist polymer as ion-implant dose is greater than 5 × 10 14 atoms/cm 2 and this crust is insoluble in wet chemicals. Usually, this kind of HDI PR removal has been achieved through a combination of dry plasma ashing and a subsequent wet chemical treatment with sulfuric acid and hydrogen peroxide mixture at elevated temperature. 1,2 These physical and chemical approaches cannot only lead to the increase in material loss and surface damage but also are troublesome at present, such as chemicals and disposals cost, ultrapure water consumptions, environmental burdens, etc. 3 Furthermore, as the feature size for integrated circuits continues to shrink down, the removal of HDI PR and postetch residues in the trenches/vias with high aspect ratio structure is extremely difficult in aqueous-based cleaning solutions due to their high surface tension and capillarity. The residues at the bottom of the trenches/vias will increase the contact resistance of interconnects, which will affect the subsequent process and eventually degrade the device performance. To fabricate smaller devices, low conductivity (ρ) copper and low dielectric constant (k) insulator are usually required to replace Al and SiO 2 as interconnects and inter-metal dielectrics, respectively, to minimize the resistance-capacitance (RC) coupli...

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confidence: 84%

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confidence: 99%

The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO₂Formulations

Han

Wang

et al. 2013

ECS J. Solid State Sci. Technol.

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“…Some heavy metals are harmful like lead and cadmium; however, some of them are necessary like iron copper for human and plants (Kadi 2009;Stafilov and Karadjova 2009;Kazi et al 2009a, b, c;Chao and Chen 2009;Kadi 2009;Hosseini et al 2010). Heavy metals occur naturally at trace concentrations in our environment; however, the concentration of heavy metals are increased in the environment due to mining, fertilizing, industrial activities and traffic (Shah et al 2009;Ji et al 2009;Najiah et al 2009;Ibrahim and El-Aal 2008;Sahayam et al 2009;.…”

Section: Introductionmentioning

confidence: 99%

Solid-phase extraction of heavy metal ions on bucky tubes disc in natural water and herbal plant samples

Soylak

Ünsal

2011

Environ Monit Assess

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A preconcentration-separation procedure has been established based on solid-phase extraction of Fe(III) and Pb(II) on bucky tubes (BTs) disc. Fe(III) and Pb(II) ions were quantitatively recovered at pH 6. The influences of the analytical parameters like sample volume, flow rates on the recoveries of analytes on BT disc were investigated. The effects of co-existing ions on the recoveries were also studied. The detection limits for iron and lead were found 1.6 and 4.9 μg L⁻¹, respectively. The validation of the presented method was checked by the analysis of TMDA-51.3 fortified water certified reference material. The presented procedure was successfully applied to the separation-preconcentration and determination of iron and lead content of some natural water and herbal plant samples from Kayseri, Turkey.

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“…Instrumental techniques such as atomic absorption spectrometry, atomic emission spectrometry, inductively coupled plasma-mass spectrometry, electroanalytical techniques [7][8][9][10][11][12][13] are used for the determination of heavy metals in real samples. However, there is two main problems in these determinations are lower elements concentrations than the qualification limits of the instrument and the negative or positive effects of concomitant ions [14][15][16][17][18][19].…”

Section: Introductionmentioning

confidence: 99%

Sorbent extraction of 4-(2-thiazolylazo) resorcinol (TAR)–metal chelates on Diaion SP-850 adsorption resin in order to preconcentration/separation

Soylak

Yılmaz

2010

Journal of Hazardous Materials

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Efficient stripping of photoresist on metallized wafers by a pause flow of supercritical fluid

Cited by 6 publications

References 18 publications

The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO₂Formulations

The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO₂Formulations

Solid-phase extraction of heavy metal ions on bucky tubes disc in natural water and herbal plant samples

Sorbent extraction of 4-(2-thiazolylazo) resorcinol (TAR)–metal chelates on Diaion SP-850 adsorption resin in order to preconcentration/separation

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Efficient stripping of photoresist on metallized wafers by a pause flow of supercritical fluid

Cited by 6 publications

References 18 publications

The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO2Formulations

The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO2Formulations

Solid-phase extraction of heavy metal ions on bucky tubes disc in natural water and herbal plant samples

Sorbent extraction of 4-(2-thiazolylazo) resorcinol (TAR)–metal chelates on Diaion SP-850 adsorption resin in order to preconcentration/separation

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The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO₂Formulations

The Stripping Behavior of High-Dose Ion-Implanted Photoresists in Supercritical CO₂Formulations