1962
DOI: 10.1016/0022-3115(62)90268-4
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Ejection of atoms from uranium by fission fragments

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Cited by 36 publications
(5 citation statements)
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“…As we noted already, it was shown in ]6] that purifying the emitter surface from oxide film increases the ejection capability, raising K from 24 to thousands of atoms. Rogers and Adam [17] confirmed this result and also showed the dependence between the sputtering ratio and the emitter integral irradiation dose by neutrons. Peterson and Thorpe ]18] studied the effect of the oxide film at the sample surface on sputtering.…”
supporting
confidence: 74%
See 1 more Smart Citation
“…As we noted already, it was shown in ]6] that purifying the emitter surface from oxide film increases the ejection capability, raising K from 24 to thousands of atoms. Rogers and Adam [17] confirmed this result and also showed the dependence between the sputtering ratio and the emitter integral irradiation dose by neutrons. Peterson and Thorpe ]18] studied the effect of the oxide film at the sample surface on sputtering.…”
supporting
confidence: 74%
“…Therefore, as the integral irradiation dose increases, the value of the ejection ratio decreases. According to data in [17], the reejection factor begins to play a noticeable role with integral fluxes with respect to thermal neutrons equal to 10 I~ neutrons/era 2. Its effect may be decreased by changing the ratio of emitter to collector surfaces.…”
Section: K Gorshkov and L N L'vovmentioning
confidence: 96%
“…While the early Russian results gave dramatically different results for the sputtering yields of oxidized foils (about 30 fissile atoms per escaped fission fragment) and polished foils, the oxide layers were presumably rather thick. In contrast, Rogers and Adam [5] did not detect any difference in sputtering yields from oxide free or oxidized samples. The oxide film in their specimens were presumably much thinner.…”
Section: B) Surface Conditionsmentioning
confidence: 65%
“…Foils with substantial oxide films were reported to have sputtering yields lower by a factor of 100. [5]. In these experiments, particular attention was paid to the time dependence of the sputter-deposited material.…”
Section: Introductionmentioning
confidence: 99%
“…The sputtering coefficient was approximately 2·10 3 atoms per fragment. According to data obtained in other works [4,5], the self-sputtering coefficient of uranium films (metallic uranium or uranium dioxide) reaches (1-5)·10 4 atoms per fragment.…”
mentioning
confidence: 90%