Elaboration and electrochemical characterization of nitrogenated amorphous carbon films

Structure and Electroanalytical Application of Nitrogen-doped Carbon Thin Film Electrode with Lower Nitrogen Concentration

“…25 Some groups have also reported electrochemical responses of nitrogen containing carbon film electrodes. [26][27][28][29][30] However, very few reports studied the relationship between carbon film structures, particularly about chemical bonds and electrocatalytic properties. 9,19 In this work, we studied N-UBM nanocarbon film electrodes with relatively low nitrogen concentration in terms of structural dependence of ORR.…”

Determination of surface amine groups on amorphous carbon nitride thin films using a one step covalent grafting of a redox probe

“…One should emphasise that, as imine-type functional groups are thought to be present on the surface of the a-CN x thin films [13,43], one can not rule out their acylation and the subsequent covalent grafting of ferrocene based redox probes. It is nevertheless unlikely that these latter are involved in the electrochemical responses shown in Figure 5.…”

“…Though sustained activity was long-carried out on the investigation of electronic, structural or mechanical properties of amorphous carbon or carbon nitride materials [5][6][7], much less effort, and only since the end of the nineties, was put on their use as electrode materials: however both a-CN x or a-CN x H y were purposely envisaged and their electrochemical activity assessed with respect to different redox couples [8][9][10][11][12][13][14][15][16][17][18][19]. a-CN x materials have been suggested for applications in liquid effluent treatment (nitrate reduction on the cathodic side, degradative oxidation of organic pollutants on the anodic side) but no achievement emerged so far.…”

“…Either vibrational (IR or Raman) spectroscopies or XPS technique allowed to prove the existence of sp 3 to sp 1 (C-N, C=N or C N) hybridizations [6,13,16,[36][37][38][39][40][41][42]. In particular, infrared absorption spectra of a-CN x thin films showed bands at 1220 cm -1 and 1650 cm -1 that can be reasonably assigned to sp 3 C-N and sp 2 C=N bonds respectively [6,13,43]. In addition, FTIR spectra of a-CN x thin films were shown to exhibit a very high visible to infrared transmittance and to reveal surface amine groups (-NH 2 ) [44].…”

Spectroscopic investigation of the physicochemical origin of the spontaneous delamination of the sputtered amorphous carbon nitride films

“…From the numerous studies, the delamination along the interface is found to be one of the major failure mechanisms occurred in various thin film/ substrate systems [1,2,4]. However, significant fundamental as well as the microstructural properties of the deposited films still remain with most current approaches to predict this failure mode [6][7][8][9][10].The aim of the present study is to investigate the microstructure origin of the observed spontaneous delamination of sputtered amorphous carbon nitrides (a-CN x ) films [8], which affect their interesting properties as promising protective coatings [11][12][13][14]. The microscopic origin of these mechanical properties seems to be attributed to their specific microstructure, which contains different configuration of the C-N bonds (sp 1 , sp 2 and sp 3 ) [15][16][17][18].…”