Elaboration and study of an elastic hard Si-based coating obtained at room temperature from a far cold remote nitrogen plasma

The development of low-temperature hardening silicone ceramer coatings for the corrosion protection of metals

“…The peak at~531.25 eV corresponds to the oxygen attached to the aluminum metal as well as to the hydroxyl group (probably an aluminum oxide hydroxide type of linkage), while the peak at~532.47 eV is due to an oxygen atom attached directly to some metal-either zinc oxide/hydroxide or Sn-O from a dibutyltindilaurate catalyst. Another peak at 534.19 eV might be due to oxygen attached to zinc, silicon or aluminum [19].…”

Critical evaluation of the state of the art of the analysis of light elements in thin films demonstrated using the examples of SiOXNY and AlOXNY films (IUPAC Technical Report)

“…XPS analysis of silicon oxynitride films was performed in [75] with an LHS-10 spectrometer utilizing the Al source with 13 keV at 20 nA. The authors used a pure silicon nitride powder from Aldrich (≥99.9 %) as reference material.…”

“…Scanning electron microscopy is used for the determination of the film thickness [136], the morphology [137], and the investigation of the sample surfaces and fracture edges [75,138]. The structure of the films is often determined by TEM through micro-diffraction.…”

“…The scratch tests in [75] were used to investigate the dynamic behavior of the silicon oxynitride films on PVC substrataes and the interaction forces by morphological evaluation of the scratches with SEM. A Berkovic indenter with a 120°trigonal-base pyramid was drawn edge forward with a controlled penetration depth, while a piezoelectric sensor recorded the interaction forces.…”

“…Microindentation curves on 4-µm-thick films with a maximum load of 10 mN were performed in [182]. A diamond pyramidal Vickers indenter was used, and load and penetration were recorded during indentation.…”