Abstract:Sputtered tantalum nitride (TaN) thin films can be used as thin film resistors (TFRs), since these thin films have been proved to have a wide range of electrical resistivity) (ρ which is around 400~3 × 10P 4 P cm Ω µ , and a relatively low and stable temperature coefficient of resistivity (TCR). However, the TCR of TaN thin film is normally negative (-150 ppm/ºC~-50 ppm/ºC) which will create a serious thermal stability problem for the performance of TaN TFRs.
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