Electrical and optical properties of thin indium tin oxide films produced by pulsed laser ablation in oxygen or rare gas atmospheres

Thestrup, B.; Schou, Jørgen; Nordskov, A.; Larsen, Niels Bent

doi:10.1016/s0169-4332(98)00659-x

Cited by 26 publications

(13 citation statements)

References 9 publications

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“…TCOs such as the most established indium tin oxide (ITO), aluminum-doped zinc oxide (AZO) and zinc oxide (ZnO) are standard integral materials in current thin-film solar PV devices [15][16][17][18]. Bulk material properties for common TCOs including ITO have been well researched and documented for different processing conditions and substrates [15,16,[19][20][21][22][23]; however, this is not the case for ultra-thin TCOs. The few exceptions include Sychkova et al [24], who reported both optical and electrical properties of 9-80 nm ITO films deposited by pulsed DC sputtering varied with thickness and showed a general increase in resistivity with decrease in film thickness [24].…”

Section: Introductionmentioning

confidence: 99%

Limitations of ultra-thin transparent conducting oxides for integration into plasmonic-enhanced thin-film solar photovoltaic devices

Gwamuri

Vora

Khanal

et al. 2015

Mater Renew Sustain Energy

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This study investigates ultra-thin transparent conducting oxides (TCO) of indium tin oxide (ITO), aluminum-doped zinc oxide (AZO) and zinc oxide (ZnO) to determine their viability as candidate materials for use in plasmonic-enhanced thin-film amorphous silicon solar photovoltaic (PV) devices. First a sensitivity analysis of the optical absorption for the intrinsic layer of a nano-disk patterned thin-film amorphous silicon-based solar cell as a function of TCO thickness (10-50 nm) was performed by simulation. These simulation results were then used to guide the design of the experimental work which investigated both optical and electrical properties of ultra-thin (10 nm on average) films simultaneously deposited on both glass and silicon substrates using conventional rf sputtering. The effects of deposition and post-processing parameters on material properties of ITO, AZO and ZnO ultrathin TCOs were probed and the suitability of TCOs for integration into plasmonic-enhanced thin-film solar PV devices was assessed. The results show that ultra-thin TCOs present a number of challenges for use as thin top contacts on plasmonic-enhanced PV devices: (1) optical and electrical parameters differ greatly from those of thicker (bulk) films deposited under the same conditions, (2) the films are delicate due to their thickness, requiring very long annealing times to prevent cracking, and (3) reactive gases require careful monitoring to maintain stoichiometry. The results presented here found a trade-off between conductivity and transparency of the deposited films. Although the sub 50 nm TCO films investigated exhibited desirable optical properties (transmittance greater than 80 %), their resistivity was too high to be considered as materials for the top contact of conventional PV devices. Future work is necessary to improve thin TCO properties, or alternative materials, and geometries are needed in plasmonic-based amorphous silicon solar cells. The stability of ultra-thin TCO films also needs to be experimentally investigated under normal device operating conditions.

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Section: Introductionmentioning

confidence: 99%

Limitations of ultra-thin transparent conducting oxides for integration into plasmonic-enhanced thin-film solar photovoltaic devices

Gwamuri

Vora

Khanal

et al. 2015

Mater Renew Sustain Energy

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“…Common deposition methods include magnetron sputtering [2], spray pyrolysis [3], electron beam evaporation [4] and pulsed laser deposition (PLD) [5][6][7][8][9][10][11][12][13][14]. PLD of ITO using a KrF excimer laser by Kim et al [6] reported a low resistivity of 2×10 -4 Ωcm and an optical transmittance of 92% in the visible range.…”

Section: Introductionmentioning

confidence: 99%

“…The ITO-coated glass was used successfully for OLED in which the performance was comparable to that of those fabricated using the commercial ITO. ITO has also been deposited using pulsed Nd:YAG laser at 355 nm [11][12][13][14] with a resistivity of about 1× 10 -4 Ωcm on heated glass and the optical transmittance was above 90%.…”

Section: Introductionmentioning

confidence: 99%

Parametric Studies of Pulsed Laser Deposition of Indium Tin Oxide and Ultra-thin Diamond-like Carbon for Organic Light-emitting Devices

Tou¹,

Yong²,

Yap³

et al. 2009

Journal of the Optical Society of Korea

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Device quality indium tin oxide (ITO) films are deposited on glass substrates and ultra-thin diamond-like carbon films are deposited as a buffer layer on ITO by a pulsed Nd:YAG laser at 355 nm and 532 nm wavelength. ITO films deposited at room temperature are largely amorphous although their optical transmittances in the visible range are > 90%. The resistivity of their amorphous ITO films is too high to enable an efficient organic light-emitting device (OLED), in contrast to that deposited by a KrF laser. Substrate heating at 200℃ with laser wavelength of 355 nm, the ITO film resistivity decreases by almost an order of magnitude to 2×10 -4 Ω cm while its optical transmittance is maintained at > 90%. The thermally induced crystallization of ITO has a preferred <111> directional orientation texture which largely accounts for the lowering of film resistivity. The background gas and deposition distance, that between the ITO target and the glass substrate, influence the thin-film microstructures. The optical and electrical properties are compared to published results using other nanosecond lasers and other fluence, as well as the use of ultra fast lasers.Molecularly doped, single-layer OLEDs of ITO/(PVK+TPD+Alq3)/Al which are fabricated using pulsed-laser deposited ITO samples are compared to those fabricated using the commercial ITO. Effects such as surface texture and roughness of ITO and the insertion of DLC as a buffer layer into ITO/DLC/(PVK+TPD+Alq3)/Al devices are investigated. The effects of DLC-on-ITO on OLED improvement such as better turn-on voltage and brightness are explained by a possible reduction of energy barrier to the hole injection from ITO into the light-emitting layer.

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“…1 Common deposition methods include magnetron sputtering, 2 spray pyrolysis, 3 electron beam evaporation 4 and pulsed laser deposition (PLD). [5][6][7][8][9][10][11][12][13][14][15] PLD of ITO using a KrF excimer laser by Kim et al 6 reported a low resistivity of 2 × 10 -4…”

Section: Introductionmentioning

confidence: 99%

“…The ITO-coated glass was used successfully for OLED which performance was comparable to that fabricated using the commercial ITO. ITO has also been deposited using pulsed Nd:YAG laser at 355 nm [12][13][14][15] with resistivity of ~ 1 × 10 -4…”

Section: Introductionmentioning

confidence: 99%

Parametric Studies of Pulsed Nd:YAG Laser Deposition of ITO for OLED Application

Yong

Yap

Tou

2008

The Review of Laser Engineering

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Device-quality ITO by pulsed Nd:YAG laser, successfully used for Organic Light Emitting Device (OLED), was deposited at room temperature and 250 o C. Although the optical transmittance of > 90% is achieved in the visible range, the ITO film resistivity is too high to enable an efficient OLED, as compared to that reported for KrF laser deposited ITO. At 250 and laser wavelength of 355 nm, the ITO film resistivity decreased by 10x to 2 × 10 -4Ωcm while its optical transmittance was > 90 %. For PET, the heating temperature was limited to o C and hence the ITO resistivity could only be decreased by a factor of 2 to 5 × 10 -4Ωcm. The thermally induced crystallization of ITO, which has a preferred <111> directional orientation texture, largely accounts for lowering of its film resistivity. The OLED was based on simple device structure of ITO/(PVK+TPD+Alq 3 )/Al, which output brightness was compared to that fabricated on the commercial ITO. Effet of an ultra-thin diamond-like carbon (DLC) layer in the OLED was investigated.

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Electrical and optical properties of thin indium tin oxide films produced by pulsed laser ablation in oxygen or rare gas atmospheres

Cited by 26 publications

References 9 publications

Limitations of ultra-thin transparent conducting oxides for integration into plasmonic-enhanced thin-film solar photovoltaic devices

Limitations of ultra-thin transparent conducting oxides for integration into plasmonic-enhanced thin-film solar photovoltaic devices

Parametric Studies of Pulsed Laser Deposition of Indium Tin Oxide and Ultra-thin Diamond-like Carbon for Organic Light-emitting Devices

Parametric Studies of Pulsed Nd:YAG Laser Deposition of ITO for OLED Application

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