2011
DOI: 10.1016/j.jallcom.2011.08.019
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Electrical and optical properties of tantalum oxide thin films prepared by reactive magnetron sputtering

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Cited by 28 publications
(17 citation statements)
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“…350 or 450 1C, leads to a shift of the edge to about 272 nm, which is expected for Ta 2 O 5 . 27,28 This effect is due to the removal of hydroxyl groups at the surface of the oxide particles, which were also visible in the before mentioned IR spectra of powders, which were heated at different temperatures. XPS spectra (Fig.…”
Section: Synthesis Of Stable Tantalum Oxide Nanoparticle Dispersionsmentioning
confidence: 68%
“…350 or 450 1C, leads to a shift of the edge to about 272 nm, which is expected for Ta 2 O 5 . 27,28 This effect is due to the removal of hydroxyl groups at the surface of the oxide particles, which were also visible in the before mentioned IR spectra of powders, which were heated at different temperatures. XPS spectra (Fig.…”
Section: Synthesis Of Stable Tantalum Oxide Nanoparticle Dispersionsmentioning
confidence: 68%
“…Tato technika pracuje za teplot výrazně nižších než metoda CVD (150-500 °C), ale rovněž výrazně nižšího tlaku (10 -2 až 10 -5 Pa). Vrstvy tvořené metodami na principu PVD mají obecně nižší vnitřní pnutí a umožňuje nanášet celou řadu materiálů [21,22].…”
Section: Pvd (Physical Vapor Deposition)unclassified
“…It is well established that amorphous materials give rise to “broadened structures” at low angles. These features are associated with the local chemical environment, and the greater the atomic weight is (and therefore the scattering cross-section), the higher the GIXRD intensity is [ 11 ]. Thus far, diffractograms of amorphous samples were employed to establish their non-crystalline nature; however, no exploitation of this technique has been carried out to obtain quantitative information concerning the short-range chemical environment.…”
Section: Introductionmentioning
confidence: 99%