Electrical and Photoresponse Properties of Al/p-Si/Y1-xSrxMnO3/Al Heterojunction Photodiodes

The Optoelectrical Properties of Li: TiO2/p‐Si Photodiodes for Various Li Doping

“…As shown in Figure 14a–d, When frequency increases, the peaks of R s decrease due to the existence of localized states and the inability of these states to follow the AC signal at high frequency. [ 52,53 ]…”

“…This deviation can be attributed to the existence of Li, the presence of barrier homogeneities, and interface states and series resistance. [52,53] The obtained n values in this study are compatible with the n values of Fe:TiO 2 -and Gd:TiO 2 -based heterojunctions previously reported by our group [42,54] and n values www.advancedsciencenews.com www.pss-a.com of undoped TiO 2 /n-Si and In-doped TiO 2 /n-Si heterojunctions reported by Ji et al [55] According to Table 2, the I 0 values of diodes, which is an indicator of the number of carriers that can surpass the barrier, increase with the Li doping. Also, the barrier heights of diodes have a decreasing trend due to the variation of reverse saturation current except for 6% Li:TiO 2 diode.…”

“…As shown in Figure 14a-d, When frequency increases, the peaks of R s decrease due to the existence of localized states and the inability of these states to follow the AC signal at high frequency. [52,53] Figure 12. The C-V graphs of Li:TiO 2 photodiodes for various Li-doping concentrations in the frequency range of 10-500 kHz.…”

Influence of Microstructure on Tribological Behaviors of Al6061 Metal Matrix Composite Reinforced with Silicon Nitride (Si3N4) and Silicon Carbide (SiC) Micro Particles

“…The standard database (JCPDS database) for XRD pattern was used to recognize the crystalline phases. Microstructure was examined using Carl-Zeiss Axio Scope 5 Optical Microscope and Carl Zeiss make Ultra Plus FESEM to know particle distribution, grain boundaries and interfacial bonding [24][25][26][27]. Samples of 20mm diameter and 15mm thick were cut, cold mounted and polished as per standard metallographic technique and etched by Keller's reagent (3 ml HCl, 2 ml HF, 5 ml HNO 3 , 190 ml H 2 O).…”