2009
DOI: 10.1016/j.mseb.2008.10.007
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Electrical and structural characterization of InAs/InGaAs quantum dot structures on GaAs

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Cited by 14 publications
(36 citation statements)
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“…[ 43 ]. The buffer layer is filled by numerous shallow levels and band non-uniformities originated from MBE growth defects and doping centers that redshift the interband absorption of GaAs [ 33 , 46 , 54 , 55 ]. For the conventional buffer-contacted InAs/GaAs nanostructure, the onset at 1.05 eV of the PV spectrum in Fig.…”
Section: Resultsmentioning
confidence: 99%
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“…[ 43 ]. The buffer layer is filled by numerous shallow levels and band non-uniformities originated from MBE growth defects and doping centers that redshift the interband absorption of GaAs [ 33 , 46 , 54 , 55 ]. For the conventional buffer-contacted InAs/GaAs nanostructure, the onset at 1.05 eV of the PV spectrum in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…As a result, InAs/InGaAs QD structures have attracted much interest in last decade [ 27 29 ]. By growing the QDs on the InGaAs MB, one can observe essential differences in the formation process and QD optical properties compared with conventional ones in GaAs matrix [ 25 , 30 33 ]. For example, the InGaAs confining layer reduces the lattice mismatch between QDs and buffer and, hence, strains in QDs.…”
Section: Introductionmentioning
confidence: 99%
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“…Furthermore, metamorphic QDs have shown interesting properties such as (i) a high QD density [ 14 ], (ii) the possibility to widely tune QD and wetting layer (WL) levels [ 10 , 15 ], and (iii) good performances of active elements in light-emitting devices [ 16 ]. However, the recent investigations of deep levels in metamorphic QDs showed that, despite InAs/In 0.15 Ga 0.85 As QD structures having a total defect density close to the QD layer comparable to that of InGaAs/GaAs pseudomorphic QDs, metamorphic structures with higher x demonstrated higher defect densities [ 17 , 18 ].…”
Section: Introductionmentioning
confidence: 99%
“…Using capacitance-voltage (C-V) measurements of capped InAs QD layers, several groups have reported carrier depletion in the vicinity of the QD layers. [10][11][12] Since the carrier depletion occurs primarily for InAs coverage beyond 3 monolayers (ML), it is often attributed to strain relaxation-induced defects which act as carrier traps. 13,14 However, for C-V and scanning capacitance microscopy, n is spatially averaged over 100s of nm 2 and lm 2 , i.e., 10-100 000 QDs.…”
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confidence: 99%