2010
DOI: 10.1016/j.tsf.2010.08.092
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Electrical behavior of p-type PbS-based metal-oxide-semiconductor thin film transistors

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Cited by 29 publications
(13 citation statements)
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“…Moreover, the carrier mobility and concentration of the films are found as 8.486 × 10 −1 m 2 V −1 s −1 and 1.976 18 m −3 , respectively. The mobility of the films is also higher than the previous data [10,20].…”
Section: B-217contrasting
confidence: 69%
“…Moreover, the carrier mobility and concentration of the films are found as 8.486 × 10 −1 m 2 V −1 s −1 and 1.976 18 m −3 , respectively. The mobility of the films is also higher than the previous data [10,20].…”
Section: B-217contrasting
confidence: 69%
“…511 P-type PbS TFTs have been prepared chemically, with low mobility in asdeposited devices but improvement after thermal annealing. 512,513 We note that channel layers are not limited to wide band gap semiconductors. TFTs using narrower band gap (<2 eV) semiconductors as channel layers have been reported, for example, CuInTe 2 .…”
Section: Solar Cellsmentioning
confidence: 99%
“…The hole mobility increases for all the devices but more significantly for ‘pure’ PbS/TBAI FETs. This effect could be explained in terms of the variation of the grain size due to the thermal annealing .…”
Section: Resultsmentioning
confidence: 99%