2013
DOI: 10.1116/1.4820129
|View full text |Cite
|
Sign up to set email alerts
|

Electrical characterization of 60Co gamma radiation-exposed InAlN/GaN high electron mobility transistors

Abstract: Articles you may be interested inSimulation and characterization of millimeter-wave InAlN/GaN high electron mobility transistors using Lombardi mobility model

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

1
7
0

Year Published

2015
2015
2024
2024

Publication Types

Select...
7

Relationship

1
6

Authors

Journals

citations
Cited by 12 publications
(8 citation statements)
references
References 26 publications
1
7
0
Order By: Relevance
“…70 Gamma ray damage.-AlGaN/GaN HEMTs irradiated with 60 Co gamma-ray doses up to 600 Mrad of 60 Co γ-rays showed an increase in reverse breakdown voltage (V RB ) by a factor of two, a negative shift in V T and a decrease in gm by 25%. 96,103 These results are consistent with the gamma-irradiation causing a decrease in the effective channel doping through introduction of deep electron traps. The irradiated devices were annealed at 200 • C for 25 minutes and these HEMTs showed partial recovery of device performance.…”
Section: Changes In Gan-based Hemt Performance After Irradiationsupporting
confidence: 80%
See 1 more Smart Citation
“…70 Gamma ray damage.-AlGaN/GaN HEMTs irradiated with 60 Co gamma-ray doses up to 600 Mrad of 60 Co γ-rays showed an increase in reverse breakdown voltage (V RB ) by a factor of two, a negative shift in V T and a decrease in gm by 25%. 96,103 These results are consistent with the gamma-irradiation causing a decrease in the effective channel doping through introduction of deep electron traps. The irradiated devices were annealed at 200 • C for 25 minutes and these HEMTs showed partial recovery of device performance.…”
Section: Changes In Gan-based Hemt Performance After Irradiationsupporting
confidence: 80%
“…These defects act as scattering centers which result in degradation of both device performance and reliability. 96,103 After annealing the device at 200 o C, the defects were reduced, resulting in an increase of both diffusion length and performance.…”
Section: Changes In Gan-based Hemt Performance After Irradiationmentioning
confidence: 99%
“…This leads to a key measure of the magnitude of the radiation damage induced, namely, the carrier removal rate. 133 This is a parameter that can be used to compare the relative amount of change expected in a semiconductor exposed to different types of radiation. In the case of MOS gate devices, there is also the possibility of damage to the gate insulator, While MOS gates are the standard in Si devices, the absence of high-quality gate oxides on most of the wide bandgap and ultra-wide bandgap semiconductors means that only SiC routinely uses this approach and most devices use metal gates.…”
Section: Total Dose and Single Event Upsetmentioning
confidence: 99%
“…Similar results were obtained for alpha particles, while electrons were less damaging. [129][130][131][132][133][134][135][136] The high gate leakage and drain current collapse in conventional Schottky gate metal devices limits the stability and performance of HEMTs. To solve these problems, MOSHEMTs can be employed to reduce the gate leakage current and passivate surface traps, with Sc 2 O 3 , MgO, SiO 2 and Si 3 N 4 , as the most effective gate dielectrics.…”
Section: Total Dose and Single Event Upsetmentioning
confidence: 99%
See 1 more Smart Citation