In recent years, semiconductor quantum dots (QDs), as a zero-dimensional quantum confined system, have attracted a great deal of attention, both from the point of view of fundamental physics and for the technological applications. The QDs, self-assembled in a barrier (or matrix) material, with dimensions smaller than 100 nm, are formed by mismatch strain in the growing thin film; this process is known as the Stranski-Krastanow growth mode. 1-3 The occurrence of QDs in various material system has been investigated by different space charge spectroscopies, such as InAs/GaAs QDs by capacitance-voltage (C-V) spectroscopy, 4,5 InP/GaInP QDs by deep level transient spectroscopy (DLTS) and admittance spectroscopy, 6 InAs/GaAs QDs embedded in the active zone of a laser diode by DLTS, 7 and Ge/Si QDs by admittance spectroscopy. 8 In this letter, we present a DLTS investigation of the electronic structure of In 0.5 Ga 0.5 As QDs self-assembled in a n-GaAs barrier and report a quantum level (QL) of 100 meV below the GaAs conduction band edge for electrons in the structure. We show that the QL definitely originates from the QDs by comparing with a reference sample, which was grown under exactly the same conditions as those used for the QD sample, but without the embedded QDs.The QD sample was grown in a Varian Gen-II molecular beam epitaxy (MBE) system using solidsource Ga and In, and a cracked As 2 beam. After deoxidization of the n + GaAs (100) substrate surface, We have investigated electron emission from self-assembled In 0.5 Ga 0.5 As/GaAs quantum dots (QDs) grown by molecular-beam epitaxy (MBE). Through detailed deep level transient spectroscopy comparisons between the QD sample and a reference sample, we determine that trap D, with an activation energy of 100 meV and an apparent capture cross section of 5.4 × 10 -18 cm 2 , is associated with an electron quantum level in the In 0.5 Ga 0.5 As/GaAs QDs. The other deep levels observed, M1, M3, M4, and M6, are common to GaAs grown by MBE.
Key words:Electron quantum level, self-assembled In 0.5 Ga 0.5 As/GaAs quantum dots, molecular-beam epitaxy (MBE), deep level transient spectroscopy (DLTS) an n --GaAs buffer layer (~0.5 µm thick), with a room temperature donor concentration of ~3 × 10 16 cm -3 , was grown at a substrate temperature of 600°C, followed by a 10-nm-thick undoped GaAs layer. The substrate temperature was then lowered to 480°C, and a single set of In 0.5 Ga 0.5 As QDs was formed by depositing ~4.8 ML of In 0.5 Ga 0.5 As. The QDs were capped by overgrowing 10 nm of undoped GaAs at 480°C; the low temperature was necessary to minimize the In-Ga interdiffusion between the dots and the cap layer. Finally, the substrate temperature was raised to 600°C, and an 0.5-µm-thick n --GaAs cap layer, with the same donor concentration as that in the buffer layer, was grown. For an uncapped sample, having QDs grown under the identical conditions as those of the capped sample, an atomic force microscope (AFM) reveals an array of closely packed QDs with a density of ~ 1 × 10 11 ...