2009
DOI: 10.1016/j.apsusc.2008.10.015
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Electrical conductivity dependence of thin metallic films of Au and Pd as a top electrode in capacitor applications

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Cited by 7 publications
(9 citation statements)
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“…Besides, the changes in the slop of the interface fracture force versus thickness curve could be demonstrated as a change at the interfacial bonding energy with increasing the thickness. Nazarpour et al [5] showed diffusion of the oxygen from STO through Pd thin film due to substrate relaxation process which could be correlated with interface fracture force curve. Fig.…”
Section: Resultsmentioning
confidence: 97%
See 1 more Smart Citation
“…Besides, the changes in the slop of the interface fracture force versus thickness curve could be demonstrated as a change at the interfacial bonding energy with increasing the thickness. Nazarpour et al [5] showed diffusion of the oxygen from STO through Pd thin film due to substrate relaxation process which could be correlated with interface fracture force curve. Fig.…”
Section: Resultsmentioning
confidence: 97%
“…High mobility materials such as pure FCC metals tend to have low intrinsic stresses when deposited at or near room temperature, but can support high extrinsic stresses [4]. Basically, residual stresses at the interface could be modulated by the substrate relaxation process [5]. In fact, the substrate relaxation process occurs due to lattice mismatch between the film and the substrate which their interfacial layer encompasses the variable lattice parameter from the lattice constant of the film to lattice constant of the substrate.…”
Section: Introductionmentioning
confidence: 99%
“…Essentially, stress is induced by external factors during the application process, but it is also an intrinsic property which is already generated during film growth [9-11]. Based on our previous studies [1], the growth of Pd over STO follows the Stranski–Krastanow growth mode where 3D islands nucleate on top of a thin wetting layer. Besides, in the case of high melting temperature film, the ad-atom mobility is assumed to be quite limited, however, raising the deposition temperature from room temperature to 300 °C, transforms the growth mode from that of a low mobility metal to the high mobility ones.…”
Section: Discussionmentioning
confidence: 99%
“…Graphite crucibles were used for resistive evaporation. The evaporation chamber was evacuated with mechanical and turbo molecular vacuum pumps until the base pressure of the chamber was 3.1×10 -7 torr [22][23]. Palladium was evaporated at 1.2 kV accelerating potential and 140 mA emission intensity.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…Previously it has been shown [22] that thin Pd films transfer the morphology of the underneath layer or substrate toward the final surface. Hence, surface roughness of Pd films depends upon substrate roughness as well as deposition conditions.…”
Section: Oscillating Nanoindentationmentioning
confidence: 99%