“…In particular, the data reported in this work quantitatively show an at least (lower estimate due to series resistances, see Figure 7) one order of magnitude higher in‐plane resistivity (i.e., charge carriers crossing domain interfaces) than out‐of‐plane resistivity (i.e., charge carriers flowing along the vertically oriented domains), in line with previously reported qualitative experimental data. [
30 ] In this framework it is important to stress out that theoretical [
50,57 ] and experimental [
29 ] works on κ‐Ga 2 O 3 as well as the comparison among similarly structurally anisotropic oxides (e.g., β‐Ga 2 O 3 [
58 ] and SnO 2 [
59 ] ) exclude the possibility that the extent of this highlighted (lower bound) anisotropy could be possibly related to the pure orthorhombic structure of Ga 2 O 3 . The measurements here reported have been performed on nominally undoped samples (
, maximum domain dimension around 20 nm, see Figure 3) deposited on GaN templates; this has been done to avoid the presence of SiO x precipitates (confined in the first 200–300 nm close to the substrate interface in layers deposited with
, see Figure 4) that could potentially interfere in the out‐of‐plane R measurements.…”