Electrical Contact Formation in Micro Four‐Point Probe Measurements

Abstract

Herein, the electrical contact formation between the electrodes of the micro four‐point technique and a semiconducting sample is described. It is shown that the contact is formed in two stages: a voltage‐induced electrical contact formation, followed by a current‐induced decrease in contact resistance. Moreover, a method is proposed allowing for precise control of the final contact resistance. Finally, it is demonstrated that the contacting process is similar on 1D fin structures, where the demonstrated control of the electrical contact is needed while measuring on nanometer‐wide fins in arrays with a pitch smaller than the electrode contact size.

Conductivity Extraction Using a 180 GHz Quasi-Optical Resonator for Conductive Thin Film Deposited on Conductive Substrate

“…The four-point probe method is widely used to characterize conductivity [ 23 , 24 , 25 ]. In this method, it is usually assumed that thin film is deposited on an insulating substrate.…”