2011
DOI: 10.1088/0268-1242/26/4/045003
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Electrical double layer gating in GaAs–(Al,Ga)As heterostructures using tetrabutylammonium bis(trifluoromethylsulfonyl)imide

Abstract: We report on the gating in GaAs-(Al,Ga)As heterostructures using the electrical double layer of ionic liquids. We employ tetrabutylammonium bis(trifluoromethylsulfonyl)imide for the ionic liquid, which has a melting point of 92 • C. As the 'ionic liquid' is solid at room temperature, the device operation is more stable compared to when an aqueous electrolyte is used. Hysteretic behavior appeared in the variation of the resistance when the negative gate bias exceeded ∼ −3 V, which is considered to be the electr… Show more

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Cited by 1 publication
(4 citation statements)
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References 22 publications
(29 reference statements)
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“…Despite the large vapour pressure of P, the P resulting from the substitution may remain on the substrate surface if the generation is faster than the evaporation. Similar survival of Bi droplets was reported in [1,2] when the substitution took place for Bi 2 Se 3 and Bi 2 Te 3 .…”
Section: Iii-v Compound Semiconductor Substratessupporting
confidence: 81%
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“…Despite the large vapour pressure of P, the P resulting from the substitution may remain on the substrate surface if the generation is faster than the evaporation. Similar survival of Bi droplets was reported in [1,2] when the substitution took place for Bi 2 Se 3 and Bi 2 Te 3 .…”
Section: Iii-v Compound Semiconductor Substratessupporting
confidence: 81%
“…(For comparison, the melting point of Sb 2 Te 3 is 629 °C.) Indeed, the mean bond energies were reported to be 422, 407 and 377 − kJ mol 1 for Bi 2 Se 3 , Sb 2 Te 3 and Bi 2 Te 3 , respectively [18]. That the substitution occurs in fewer cases for Bi 2 Te 3 than for Bi 2 Se 3 is, therefore, unexpected.…”
Section: Iii-v Compound Semiconductor Substratesmentioning
confidence: 98%
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