2001
DOI: 10.1002/1521-396x(200112)188:3<1093::aid-pssa1093>3.0.co;2-x
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Electrical Properties of Nanocrystalline n-SnO2 to Single Crystal p-Si Interfaces under Gas Adsorption Conditions

Abstract: We present a study of heterostructures based on thin n-SnO 2 layers prepared by means of an aerosol pyrolysis on a single crystalline p-Si substrate. SnO 2 films are composed of 6-8 nm grains segregated into agglomerates of about 0.1 mm providing a porous structure of the film. Currentvoltage (I -V) characteristics are taken in the temperature interval 180-300 K. Capacitance-voltage (C -V) curves are obtained at frequencies of the reference signal varied within 0.5-20 kHz at 300 K. Electrical properties of the… Show more

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Cited by 4 publications
(3 citation statements)
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“…64 Nitrogen dioxide molecules are electron acceptors and form a surface level in the band gap. The energy of this level is lower than that of the acceptor level of 93 chemisorbed oxygen. 113 Thus, adsorption of NO 2 molecules causes a decrease in the effective carrier concentration and, correspondingly, a decrease in the barrier height.…”
Section: Semiconductor/semiconductor Structuresmentioning
confidence: 79%
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“…64 Nitrogen dioxide molecules are electron acceptors and form a surface level in the band gap. The energy of this level is lower than that of the acceptor level of 93 chemisorbed oxygen. 113 Thus, adsorption of NO 2 molecules causes a decrease in the effective carrier concentration and, correspondingly, a decrease in the barrier height.…”
Section: Semiconductor/semiconductor Structuresmentioning
confidence: 79%
“…Calculated using the current ± voltage (1, 3) and capacitance ± voltage (2, 4 ) curves. 93 Gas concentration: C2H5OH (1%) and NO2 (0.01%).…”
Section: Semiconductor/semiconductor Structuresmentioning
confidence: 99%
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