Electrical properties of strained off-stoichiometric Cu–Cr–O delafossite thin films
Marco Moreira,
Jonathan Crêpellière,
Jérôme Polesel-Maris
et al.
Abstract:Off-stoichiometric Cu-Cr-O delafossite thin films with different thicknesses were grown by metal organic chemical vapor deposition on substrates with different coefficients of thermal expansion. Seebeck thermoelectric coefficient and resistivity measurements were performed on the range of 300-850 K. A qualitative change in the temperature-dependence of the resistivity is observed at the temperature corresponding to the deposition process, where the transition from tensile to compressive strain takes place. Arr… Show more
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