2010
DOI: 10.1002/pssc.201000263
|View full text |Cite
|
Sign up to set email alerts
|

Electrically active centers introduced in p‐type Si by rapid thermal processing

Abstract: On the investigation of the mechanism of phosphorus gettering of metal impurities, vacancies have been generated through proton-irradiation.The resulting irradiation-induced defects were examined for reactions with Fe after heat treatments. Based on the evolution of defect concentrations by isochronal annealings, it is found that Fe interacts with the divacancy and the vacancy-oxygen complexes, forming deep levels of 0.28 eV and 0.34 eV above the valence band edge (E V ), respectively.In the search for substit… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 21 publications
(25 reference statements)
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?