2010
DOI: 10.1016/j.jelechem.2010.02.011
|View full text |Cite
|
Sign up to set email alerts
|

Electrochemical adsorption studies of urea on copper surface in alkaline medium

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

1
6
0

Year Published

2011
2011
2022
2022

Publication Types

Select...
8

Relationship

1
7

Authors

Journals

citations
Cited by 17 publications
(7 citation statements)
references
References 24 publications
1
6
0
Order By: Relevance
“…8a. The water contact angle of this sample was 52°, in good agreement with values reported by other authors [6]. Upon immersion in caffeine-free 0.1 mol L −1 H 2 SO 4 solutions, the contact angle was found to decrease to 31° ( Fig.…”
Section: Surface Analysissupporting
confidence: 91%
See 1 more Smart Citation
“…8a. The water contact angle of this sample was 52°, in good agreement with values reported by other authors [6]. Upon immersion in caffeine-free 0.1 mol L −1 H 2 SO 4 solutions, the contact angle was found to decrease to 31° ( Fig.…”
Section: Surface Analysissupporting
confidence: 91%
“…The broad range of applications is based on the corrosion stability of these materials, in spite of the fact that copper reacts easily in oxygen-containing electrolytes [6]. The constant use of equipment based on copper materials results in corrosion products, which form deposits that may eventually affect the performance of installations.…”
Section: Introductionmentioning
confidence: 99%
“…It was found that the data for the electrode surface coverage h, corresponding to inhibitors concentration can be well fitted with modified Langmuir adsorption isotherm [13] equation.…”
Section: Adsorption Isothermmentioning
confidence: 92%
“…Here the inhibition process is based upon the adsorption of inhibitor ions or molecules onto metal surface. As far as copper metal is concerned it is noticed that presence of heteroatom such as nitrogen, oxygen, sulphur and phosphorous in the organic compound improves its action as corrosion inhibitor [12,13]. The copper atom having vacant 'd' orbital accepts electrons from the heteroatom (s) which causes strong association between the two.…”
Section: Introductionmentioning
confidence: 99%
“…Heterocyclic composite counting the group of mercapto has also been introduced as inhibitors for Cu for distinct manufactures uses [13]. Azole assembled contains N atoms, which reply with Cu between the electrons lone pair to obtain complexes (Cu-azole) [14]. These complexes are supposed prevalence to be polymeric in form and nature coating film adherent on the alloy including Cu, which play as a barrier to attraction ions such as Cl.…”
Section: Introductionmentioning
confidence: 99%