2023
DOI: 10.3390/ma16062278
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Electrochemical Atomic Force Microscopy Study on the Dynamic Evolution of Lithium Deposition

Abstract: Lithium metal is one of the most promising anode materials for lithium-ion batteries; however, lithium dendrite growth hinders its large-scale development. So far, the dendrite formation mechanism is unclear. Herein, the dynamic evolution of lithium deposition in etheryl-based and ethylene carbonate (EC)-based electrolytes was obtained by combining an in situ electrochemical atomic force microscope (EC-AFM) with an electrochemical workstation. Three growth modes of lithium particles are proposed: preferential,… Show more

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Cited by 3 publications
(5 citation statements)
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“…For example, Kelvin probe force microscope (KPFM) mode is widely used to measure the work function or surface potential of the sample. [70][71][72] Shi et al 73 used KPFM to distinguish the surface properties of SEI at the top and edge in deposited Li particles. In addition, the PeakForce TUNA mode utilizes the quantum tunneling effect to measure the electrical conductivity of the sample.…”
Section: Investigation Of the Electric And Electrochemical Properties...mentioning
confidence: 99%
See 4 more Smart Citations
“…For example, Kelvin probe force microscope (KPFM) mode is widely used to measure the work function or surface potential of the sample. [70][71][72] Shi et al 73 used KPFM to distinguish the surface properties of SEI at the top and edge in deposited Li particles. In addition, the PeakForce TUNA mode utilizes the quantum tunneling effect to measure the electrical conductivity of the sample.…”
Section: Investigation Of the Electric And Electrochemical Properties...mentioning
confidence: 99%
“…(A) In situ AFM testing of lithium metal growth process. 73 (B) Correlation between particle size and density of lithium metal deposited over time using varying concentrations of electrolyte. 87 (C) The growth behavior of lithium metal is limited by SEI.…”
Section: The Dynamic LI Growth Process Investigated By Afmmentioning
confidence: 99%
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