Preparation of thin film substrates and electrolytesAll reagents used for the deposition were of analytical grade. Prior to the deposition, the Indium Tin Oxide (ITO) coated glass substrates were ultrasonically cleaned in deionized water and followed by ethanol. All solutions were prepared using 30 ml of deionized water. The electrodeposition of thin film semiconductors on ITO-coated glass substrates was carried out at 40±2ºC of temperature in an aqueous solution containing Nickel Sulphate Hexahydrate, NiSO 4. 6H 2 O (1mM) + Sodium Thiosulphate Pentahydrate, Na 2 S 2 O 3 (3mM) as precursors