2021
DOI: 10.1016/j.jtice.2021.05.029
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Electrochemical deposition of copper using a modified electrode with polyaniline film: Experimental analysis and ANN-based prediction

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Cited by 9 publications
(2 citation statements)
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“…The main causes of rough coating, pinholes, and other defects in the high-current-density areas of a hull cell are that the current density is too high, the metal copper deposition rate is too fast, which increases concentration polarization, and the cathode hydrogen evolution is aggravated. , As the current density decreases, copper is deposited at a slower pace; concentration polarization slows, and coating deposition becomes denser and less flaky as the electrode gap gradually widens. The PUB2 additive is quickly adsorbed onto the surface of the copper layer on the cathode after being added.…”
Section: Resultsmentioning
confidence: 99%
“…The main causes of rough coating, pinholes, and other defects in the high-current-density areas of a hull cell are that the current density is too high, the metal copper deposition rate is too fast, which increases concentration polarization, and the cathode hydrogen evolution is aggravated. , As the current density decreases, copper is deposited at a slower pace; concentration polarization slows, and coating deposition becomes denser and less flaky as the electrode gap gradually widens. The PUB2 additive is quickly adsorbed onto the surface of the copper layer on the cathode after being added.…”
Section: Resultsmentioning
confidence: 99%
“…For data analysis, online servers with real-time processing capability will support massive electrochemical data processing. Artificial intelligence (AI) technology based on artificial neural network (ANN) is used to establish the corresponding relationship between input variables and output characteristics due to its excellent modeling ability to describe arbitrary function relations, especially for complex nonlinear systems . All these will help to build a real-time and online monitoring system.…”
Section: Introductionmentioning
confidence: 99%