2012
DOI: 10.2116/analsci.28.127
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Electrochemical Detection of Sugar-related Compounds Using Boron-doped Diamond Electrodes

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Cited by 13 publications
(7 citation statements)
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“…Removal of TA was not observed at the OCP (0–20 min), was removed 18.7 ± 2.0% in the permeate stream at an anodic potential of 2.14 V (20–40 min), and was removed 57.8 ± 1.2% at an anodic potential of 2.64 V (>40 min) (Figure c). Figure d shows the detection of HTA in the permeate stream, which indicates that HTA concentrations approximately doubled upon raising the potential from 2.14 to 2.64 V. The yield of HTA was 0.03 ± 0.03% at 2.14 V and 0.1 ± 0.06% at 2.64 V. Reported OH • generation potentials are above 2.2 V, and at potentials higher than 2.8 V, significant concentrations of OH • form. Therefore, our experimental results are consistent with the standard electrode potential for the OH • generation half reaction (H 2 O ↔ OH • + H + + e – ) ( E o = 2.38 V), and provide conclusive evidence for OH • formation on the Ti 4 O 7 anode (REM-3).…”
Section: Resultssupporting
confidence: 82%
“…Removal of TA was not observed at the OCP (0–20 min), was removed 18.7 ± 2.0% in the permeate stream at an anodic potential of 2.14 V (20–40 min), and was removed 57.8 ± 1.2% at an anodic potential of 2.64 V (>40 min) (Figure c). Figure d shows the detection of HTA in the permeate stream, which indicates that HTA concentrations approximately doubled upon raising the potential from 2.14 to 2.64 V. The yield of HTA was 0.03 ± 0.03% at 2.14 V and 0.1 ± 0.06% at 2.64 V. Reported OH • generation potentials are above 2.2 V, and at potentials higher than 2.8 V, significant concentrations of OH • form. Therefore, our experimental results are consistent with the standard electrode potential for the OH • generation half reaction (H 2 O ↔ OH • + H + + e – ) ( E o = 2.38 V), and provide conclusive evidence for OH • formation on the Ti 4 O 7 anode (REM-3).…”
Section: Resultssupporting
confidence: 82%
“…However, the latter is more convenient for the deposition of doped diamond on large surfaces (Luong et al, 2009). Different types of substrates can be used for deposition of BDD films, such as silicon (Haenni et al, 1998), tungsten (Pleskov et al, 1987), and niobium (Hayashi et al, 2012), among others (Luong et al, 2009). Silicon substrates are the most used bases in electroanalysis.…”
Section: Fabrication and Surface Activation Procedures For Bdd Electrmentioning
confidence: 99%
“…Serum samples [186] (continued) 7.5 Hyphenated Techniques for LC and FIA M Urine and plasma samples [198] (continued) [209] (continued) …”
Section: Hyphenated Techniques For Lc and Fiamentioning
confidence: 99%