Anatase TiO 2 photoanodes were deposited by self-limiting growth techniques at low temperature. The optical bandgap and flatband voltage of the as-deposited films agree with the values obtained from single crystal anatase. The donor density could be increased by both UV illumination and cathodic polarization in acidic solutions. Improvements in photocurrent scaled closely with changes in carrier concentration, with over 20-fold enhancements observed over the as-deposited films. The threshold potential for hydrogen intercalation was Ϫ0.6 V vs Ag/AgCl. At this level the carrier concentration could be manipulated with no change in optical transmission. At lower potentials irreversible changes are observed which are attributed to the reduction of the underlying indium tin oxide contact. In contrast, no changes were observed when fluorinated tin oxide was used as the contact layer.TiO 2 films have been widely studied as photocatalysts for water splitting and degradation of organic contaminants since the early 1970s. 1,2 Various techniques have been used to synthesize TiO 2 thin films including oxidation of titanium, 3 chemical vapor deposition ͑CVD͒, 4 plasma-enhanced chemical vapor deposition ͑PECVD͒, 5 and sputtering. 6 More recently, self-limiting growth techniques such as atomic layer deposition have been introduced to provide digital control. 7,8 Our group has recently developed both plasma-enhanced atomic layer deposition ͑PEALD͒ 9 and pulsed PECVD 10 processes for the synthesis of titania at low temperature ͑Յ200°C͒ using TiCl 4 and O 2 . In PEALD, perfect conformality is achieved, allowing uniform deposition on complex topographies. The resulting films produced by both techniques displayed a polycrystalline anatase morphology with no detectable chlorine impurities. 9,10 In this work we focus on the photoelectrochemical properties of these films and compare their performance with that of TiO 2 films deposited by other techniques. Photoanodes were formed by depositing TiO 2 on glass coated with transparent conducting oxides ͑TCOs͒. In particular, we systematically explore electrochemical doping using cathodic polarization as a means to control the carrier concentration and enhance the photoresponse. In addition, the role of the underlying TCO contact was evaluated by comparing photoanodes produced with indium tin oxide ͑ITO͒ and fluorinated tin oxide ͑FTO͒.
ExperimentalTiO 2 thin films were deposited on TCO-coated glass by both PEALD and pulsed PECVD. Details on the two deposition processes are found in the literature. 9,10 In all cases, the deposition temperature was T = 200°C. Thin ͑70 nm͒ and thick ͑255 nm͒ sets of films were produced to explore the effect of film thickness. Film thickness was determined by spectroscopic ellipsometry ͑J. A. Woollam͒. Most of the results presented below were achieved with pulsed PECVD films, but nominally identical results were obtained with PEALD films. The two TCOs employed were commercial FTO ͑Libby-Owens-Ford, R s ϳ 10 ⍀/ᮀ͒ or 200 nm thick ITO layers that were sputtered in...