Electrochemical Kinetics of the Anodic Formation of Oxide Films

Rysselberghe, Pierre Van; Johansen, H. A.

doi:10.1149/1.2427345

Cited by 18 publications

(4 citation statements)

References 8 publications

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“…(20) can be written as: (23) This is the usual form of the classical equation for high-field models. As pointed out by Lohrengel, the general model described above does not require any assumption as to the position of the activation barrier.…”

Section: The High-field Modelmentioning

confidence: 99%

Current Understanding of Ti Anodisation: Functional, Morphological, Chemical and Mechanical Aspects

Vanhumbeeck¹,

Proost²

2009

Corrosion Reviews

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This paper provides an overview of the current understanding of the Ti anodisation process. As compared to other valve-metals, Ti exhibits several significant differences regarding its anodisation behaviour, the most important one being the marked semiconducting character of its anodic oxide. In the first part of this paper, a general introduction to anodisation processes is given and theoretical models describing the growth kinetics, breakdown and internal stress development in anodic oxide films are presented. In the second part, the peculiarities of Ti regarding the anodisation behaviour are discussed extensively. In particular, the influence of the main experimental parameters (metal substrate, electrolyte and growth rate) on both the anodisation process and the functional, morphological, chemical and mechanical characteristics of the anodic films is reviewed.This review intends to provide an overview of the current understanding of the process of Ti anodisation. Anodisation has been used for almost eighty years, primary in the field of corrosion science, as a simple and efficient way of producing thick protective oxide coatings on the so-called 'valve-metals' (Al, Ta, Ti, Nb, Zr, Hf and W) and their alloys. Anodisation is a very peculiar oxidation process in that it relies on the migration of ions across solid films over rather large distances, typically up to several hundreds of nanometres, the migration being promoted by very high electric fields of the order of 10 7 ' joris.proost@uclouvain.be 117 Brought to you by | Purdue University Libraries Authenticated Download Date | 5/28/15 6:56 PM

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Section: The High-field Modelmentioning

confidence: 99%

Current Understanding of Ti Anodisation: Functional, Morphological, Chemical and Mechanical Aspects

Vanhumbeeck¹,

Proost²

2009

Corrosion Reviews

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“…The above results indicate that the oxide film at the aluminum interface may be partially ruptured under load conditions (17)(18)(19)(20), increasing the corrosion rate.…”

Section: Rpolmentioning

confidence: 78%

Corrosion and Histopathological Studies on Anode Materials for Implantable Power Sources

Beard¹,

Carim²,

Dubin³

et al. 1974

J. Electrochem. Soc.

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Pacemakers and biotelemeters are being powered by implantable hybridKey words: in rive corrosion, aluminum, zinc, magnesium AZ31B, biocompatibility. ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 138.251.14.35 Downloaded on 2015-05-23 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 138.251.14.35 Downloaded on 2015-05-23 to IP

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“…In almost all the literature on the anodization of valve metals, the oxide formation rate is related to i by an empirical relation having the form [26,[42][43][44]: where a and b are empirical constants characteristic of the system (metal/solution). According to (24), the plot of log(dE/ dt)i against log i yields a straight line relation.…”

Section: Oxide Formation Rate and Reciprocal Capacitymentioning

confidence: 99%

Evidence for the activation‐controlled galvanostatic growth of thin Anode Films on Tin in some neutral media

Ammar

Darwish

Khalil

et al. 1986

Materialwissenschaft Werkst

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Growth of thin transparent anode films on Sn in neutral media has been studied by measuring the galvanostatic anodic charging curves in phosphate buffer, 0.1MKCl and 0.1M Na2S0, solutions (pH 6.6-6.7) at low current densities. The experimental technique is essentially the same as that used in previous investigations on valve metals. Although the rise in the anode potential of Sn does not exceed 2.0 V, the shape of the anodic charging curve is identical to that observed on valve metals: being thus composed of a linear and a non-linear region. Application of the kinetics of galvanostatic anodization to the results on Sn show that: (i) the oxide formation rate is linearly related to the ionic current density i by a double logarithmic plot, (ii) the reciprocal capacity is linearly related to log i, and (iii) the Tafel behaviour is exhibited at constant charge. These relations indicate that the anode film growth occurs by an activation-controlled ion conduction under the influence of the electric field across the film phase according to an exponential law. Treatment of the results allows the estimation of some kinetic parameters of film growth, e.g.: (i) the constants a and b of the empirical relation between oxide formation rate and i, (ii) the constants A and B of the exponential law, (iii) the electric field which is of the order of lo6 V/cm in phosphate, and lo7 Vlcm in both chloride and sulphate solutions, and (iv) the effective activation distance for the ionic jump over the energy barrier associated with cation transport within the film, whereupon relative (and not absolute) values can only be obtained. Comparison between the present results and previous ones (also on Sn) taken by potentiodynamic technique shows that while diffusion kinetics play an important role in the formation of thick anode films by the potentiodynamic technique, activatian-controlled kinetics explain the present results on the galvanostatic formation of thin transparent anode films.

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Electrochemical Kinetics of the Anodic Formation of Oxide Films

Cited by 18 publications

References 8 publications

Current Understanding of Ti Anodisation: Functional, Morphological, Chemical and Mechanical Aspects

Current Understanding of Ti Anodisation: Functional, Morphological, Chemical and Mechanical Aspects

Corrosion and Histopathological Studies on Anode Materials for Implantable Power Sources

Evidence for the activation‐controlled galvanostatic growth of thin Anode Films on Tin in some neutral media

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