Amorphous WO 3 films are obtained by using the oxoalkoxide precursor WO(O t Bu) 4 . This compound is easily evaporated at 80 C, and reacts with water at the surface of the substrate (Si(100) or soda lime glass (KGlass)) to give films of tungsten oxide in a combined CVD sol±gel process. The films deposited at low temperatures (150 C, Si(100), or 100 C, KGlass) can be defined as tungstic species (of general formula WO n (OH) m ), having interesting electrochromic properties. Thermal treatment at temperatures over 400 C converts the material to a more typical WO 3 film.