Electrochemical reduction of tantalum and titanium halides in 1-butyl-1-methylpyrrolidinium bis (trifluoromethyl-sulfonyl)imide and 1-butyl-1-methylpyrrolidinium trifluoromethanesulfonate ionic liquids

Abstract

The electrodeposition of tantalum-titanium–based films using different tantalum and titanium halides was investigated in two ionic liquids, namely, 1-butyl-1-methylpyrrolidinium bis (trifluoromethyl-sulfonyl)imide ([BMP][TFSI]) and 1-butyl-1-methylpyrrolidinium trifluoromethanesulfonate ([BMP][OTf]). Cyclic voltammetry was used to analyse the electrochemistry of the electrolytes and potentiostatic deposition was performed to evaluate the feasibility of electrodepositing tantalum-titanium–based layers. Both the metal salts and the ionic liquid influenced the electrochemical reduction of the tantalum and titanium halides significantly. While titanium halides considerably retarded the reduction of tantalum pentahalides and inhibited electrodeposition in many electrolytes, an electrolyte composition from which tantalum and titanium-containing layers could be deposited was identified. Specifically, in TaBr5 and TiBr4 in [BMP][TFSI], TiBr4 did not inhibit the deposition of tantalum and titanium was co-deposited itself by a three-step reduction mechanism as confirmed by cyclic voltammetry and energy-dispersive X-ray spectroscopy. Furthermore, [BMP][TFSI] led to smoother and more compact deposits.