2010
DOI: 10.1016/j.optmat.2010.05.009
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Electrodeposited ZnCdO thin films as conducting optical layer for optoelectronic devices

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Cited by 11 publications
(9 citation statements)
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“…In their study, Li et al observed a gradual shift of the band gap from 3.37 to 3.25, 3.10, and 2.91 eV for x values of 0, 5, 9, and 15 atom % in Zn 1– x Cd x O alloys. In our experiment this shift is less marked but is in general agreement with previous works. , The decrease in total optical transmittance with increasing Cd incorporation into ZnO NWs could be explained by possible appearance of more oxygen vacancies and Zn or Cd interstices, which lead to higher carrier concentration and accordingly to lower optical transmittance . Transparency of alloyed ZnO in the 1500–2100 nm interval (see Figure ) decreases with increasing doping level, i.e., with an increasing concentration of free carriers in Zn 1– x Cd x O layers.…”
Section: Optical Propertiessupporting
confidence: 92%
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“…In their study, Li et al observed a gradual shift of the band gap from 3.37 to 3.25, 3.10, and 2.91 eV for x values of 0, 5, 9, and 15 atom % in Zn 1– x Cd x O alloys. In our experiment this shift is less marked but is in general agreement with previous works. , The decrease in total optical transmittance with increasing Cd incorporation into ZnO NWs could be explained by possible appearance of more oxygen vacancies and Zn or Cd interstices, which lead to higher carrier concentration and accordingly to lower optical transmittance . Transparency of alloyed ZnO in the 1500–2100 nm interval (see Figure ) decreases with increasing doping level, i.e., with an increasing concentration of free carriers in Zn 1– x Cd x O layers.…”
Section: Optical Propertiessupporting
confidence: 92%
“…Several techniques such as thermal evaporation, chemical vapor deposition, thermolysis, chemical bath deposition, spray pyrolysis, and electrochemical deposition have been employed to fabricate Cd–ZnO material. Among the growth deposition techniques of Zn 1– x Cd x O, electrochemical deposition is a powerful approach with huge potential for industrialization due to its simplicity, cost-efficiency, reproducibility, large-area deposition, low synthesis temperature, and good-quality nanomaterial. , Moreover, electrochemical deposition allows mixing of the chemicals at the atomic level, thus reducing the possibility of secondary phase formation.…”
Section: Introductionmentioning
confidence: 99%
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