Electrodepositing Ni-TiN/Si₃N₄ Composite Layer with Variation of Current Density

Abstract

Composite of two phases with crystal grains of titanium nitride (TiN) and amorphous of silicon nitride (Si3N4) had shown an improvement of mechanical properties as shown by composite layer of nickel (Ni) and TiN. In this study, Ni-TiN/Si3N4 composite layer on tungsten carbide bar have been prepared by using electrodeposition to study the effect of current density on the microstructure and mechanical properties of the layer. The optimum properties of composite coating with no crack morphology and maximum hardness was shown by the sample electrodeposited at current density of about 2.5 mA/cm2. The high hardness was attributed to the nickel crystallite size refinement