2009
DOI: 10.1016/j.electacta.2009.06.089
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Electrodeposition and characterization of Bi2Se3 thin films by electrochemical atomic layer epitaxy (ECALE)

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Cited by 45 publications
(40 citation statements)
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“…The environment of the deposited atoms is different, and the resistance of the film increases with its thickness. This behavior has already been reported and discussed in many works [15,18,27,34]. Therefore, the control of the deposition process is complex.…”
Section: Electrochemical Behavior Of Sb On Aumentioning
confidence: 72%
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“…The environment of the deposited atoms is different, and the resistance of the film increases with its thickness. This behavior has already been reported and discussed in many works [15,18,27,34]. Therefore, the control of the deposition process is complex.…”
Section: Electrochemical Behavior Of Sb On Aumentioning
confidence: 72%
“…The crucial point in material electrodeposition is to control the dimensions, the stoichiometric ratio, and the crystallinity of the deposited structures. The electrochemical atomic layer epitaxy (EC-ALE) technique developed by Stickney [13] was proved to be a valid approach to control these parameters for the deposition of chalcogenide compounds on metallic substrates [14][15][16][17][18][19]. This method is based on the alternate underpotential deposition of atomic layers of the elements that form the compound, in a cycle that can be repeated as many times as desired.…”
Section: Introductionmentioning
confidence: 99%
“…There was a red shift towards lower energies with increasing substrate temperature for the samples. Lower values have been reported in thin films, 0.35 eV [7] and 0.55 eV [22]. This wider band gap values in nanostructures may be due to quantum confinement effects [1].…”
Section: Resultsmentioning
confidence: 86%
“…Recently, research attention geared toward chemical and electrochemical synthesis of nanostructured colloidal chalcogenide semiconductors has increased several folds [1][2][3][4][5][6][7][8][9][10]. In this group, Bi 2 Se 3 nano-and microsised clusters, isolated or well-adhered morphological orientations have been reported in literature.…”
Section: Introductionmentioning
confidence: 99%
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