1995
DOI: 10.1149/1.2048579
|View full text |Cite
|
Sign up to set email alerts
|

Electrodeposition of Metal Adlayers on Boron‐Doped Diamond Thin‐Film Electrodes

Abstract: A preliminary investigation of the electrochemical deposition of Pt, Pb, and Hg adlayers on conductive diamond thin-film surfaces has been made using cyclic voltammetry and scanning electron microscopy. The diamond thin films employed were polycrystalline, grown on conductive Si substrates (1 cm 2) to a thickness of ca. 14 i~m, and doped with boron at a nominal atomic concentration ranging between 10 ~9 and 102~ cm -3. The cyclic volammetric measurements were performed both in a conventional glass electrochemi… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

7
61
0
2

Year Published

1995
1995
2016
2016

Publication Types

Select...
5
2

Relationship

0
7

Authors

Journals

citations
Cited by 75 publications
(70 citation statements)
references
References 2 publications
7
61
0
2
Order By: Relevance
“…A current crossover is therefore observed. Such voltammetric behavior is characteristic of a nucleation and growth mechanism [39,40] in which the initial formation of Pb nuclei on the diamond surface at À 0.70 V serves to increase the rate of further deposition. Thus on the return scan the cathodic current flows at less negative potentials than those required to initiate deposition.…”
Section: Resultsmentioning
confidence: 99%
“…A current crossover is therefore observed. Such voltammetric behavior is characteristic of a nucleation and growth mechanism [39,40] in which the initial formation of Pb nuclei on the diamond surface at À 0.70 V serves to increase the rate of further deposition. Thus on the return scan the cathodic current flows at less negative potentials than those required to initiate deposition.…”
Section: Resultsmentioning
confidence: 99%
“…Unfortunately, an accurate evaluation of the electrochemically active area of Pt is difficult because under a repetitive potential cycling between 0 and 1.4 V/ NHE, a progressive decrease of the characteristic Pt peaks occurs as previously reported [8]. Nevertheless, the amount of Pt deposited onto SiBDD and its growth can be roughly followed by using the macroscopic information obtained by cyclic voltammetry.…”
Section: Resultsmentioning
confidence: 95%
“…Nevertheless, our approach, in which Pt is mainly used for testing the surface of diamond, is quite different from the incorporation by DC-sputtering of Pt and Pt/Ru particles into BDD thin films to obtain promising materials needed in electro-catalytic applications [7]. The metallic deposits of Pt anchored into the diamond matrix present good stability under long-term potential cycling while this is not the case for Pt simply electrodeposited on the diamond surface [8]. (Siltronix, 10 mm in diameter, <0.1 V cm).…”
Section: Introductionmentioning
confidence: 99%
“…In this case, the electrode was kept in the cathodic region long enough to further promote electrolytic accumulation of copper before the anodic scan. Moreover, a crossover was observed at À 0.4 V between the currents registered during scanning in the anodic and cathodic direction; this voltammetric behavior is characteristic of a metal deposition mechanism described by nucleation and growth, in which the initial formation of copper nuclei on the electrode surface increases the rate of further deposition [25,26]. The cyclic voltammogram also indicated a pronounced positive shift of the hydrogen evolution overpotential in the reverse negative scan with respect to the forward positive scan.…”
mentioning
confidence: 84%