In this study, a different number of indium zinc oxide (IZO) interlayers are fabricated into Al
2
O
3
‐based transparent resistive switching memory on a transparent indium tin oxide (ITO)/glass substrate at room temperature. Al
2
O
3
/IZO multilayer transparent memory has a transmittance of at least 65% in the wavelength range of 400–900 nm. In addition, the Al
2
O
3
/IZO multilayer transparent memory can achieve an electroforming voltage that is 35.7% lower than that of ITO/pure‐Al
2
O
3
/IZO transparent memory. The fabricated Al
2
O
3
/IZO multilayer transparent memory exhibits typical bipolar resistive switching behavior, regardless of the number of IZO interlayers. Also, the fabricated Al
2
O
3
/IZO multilayer transparent memory has a low operating voltage within ±1.5 V. In addition, a flexible Al
2
O
3
/IZO multilayer transparent memory is fabricated using the same process on ITO‐coated polyethylene terephthalate. The fabricated flexible transparent memory also maintains the resistive switching characteristics during the bending state.