Electrohydrodynamic atomization deposition and mechanical polishing of PZT thick films

Improving Chemical Mechanical Polishing Efficiency of PZT with Less than 100 ppm SO4 2−

“…However, the surface roughness of PZT films is relatively high, which may cause adverse effects on the contact performance of metal electrodes sputtered above and the resultant device performance. 2,3 Wang et al 2 reported that when the surface roughness Ra of PZT decreased from 422 nm to 23 nm by polishing, the piezoelectric constant was improved from 65 pCN −1 to 76 pCN −1 . Therefore, it is necessary to reduce the surface roughness of PZT to obtain high-performance MEMS.…”

“…It was found that the material removal rate (MRR) obtained with the silica slurry was higher than the ceria slurry, which may be because the ceria is much softer. Wang et al 2 used the colloidal silica slurry to polish the PZT film. It was shown that the surface roughness Ra of the PZT film decreased from 442 nm to 23 nm after polishing for 60 min.…”