Electromagnetic modelling of a microwave cavity used for the deposit of amorphous carbon films on the inner wall of PET bottles

Silva, F.; Bonnin, X.; Gicquel, A.; Boutroy, N.; Chomel, N.; Desoutter, Luc

doi:10.1016/j.diamond.2006.12.041

Cited by 9 publications

(8 citation statements)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The solution methods using a wave propagation analysis based on a set of dispersion equations in the frequency domain were developed for a large number of plasma structures such as surface-wave discharges [66,[70][71][72] or magnetized plasmas [5,18,[72][73][74]. As far as MW cavity systems are concerned, both frequency [75][76][77][78][79] and time domain [20] approaches were used to investigate the EM field in the cavity. The frequency domain analysis was mainly used to determine the cavity resonance that gives the different EM field configurations that can be excited in an empty cavity, i.e.…”

Section: Em Model For Mw Cavity Dischargesmentioning

confidence: 99%

“…The frequency domain analysis was mainly used to determine the cavity resonance that gives the different EM field configurations that can be excited in an empty cavity, i.e. without the plasma [75][76][77][78]. Following the approach used for surface wave discharges, attempts were also made to describe the plasma generated in the MW cavity configuration using the so-called θ parameter which represents the power required to sustain one electron-ion pair [5,80,81].…”

Section: Em Model For Mw Cavity Dischargesmentioning

confidence: 99%

See 1 more Smart Citation

Modelling of diamond deposition microwave cavity generated plasmas

Hassouni¹,

Silva²,

Gicquel³

2010

J. Phys. D: Appl. Phys.

114

View full text Add to dashboard Cite

Some aspects of the numerical modelling of diamond deposition plasmas generated using microwave cavity systems are discussed. The paper mainly focuses on those models that allow (i) designing microwave cavities in order to optimize the power deposition in the discharge and (ii) estimating the detailed plasma composition in the vicinity of the substrate surface. The development of hydrogen plasma models that may be used for the self-consistent simulation of microwave cavity discharge is first discussed. The use of these models for determining the plasma configuration, composition and temperature is illustrated. Examples showing how to use these models in order to optimize the cavity structure and to obtain stable process operations are also given. A transport model for the highly reactive H2/CH4 moderate pressure discharges is then presented. This model makes possible the determination of the time variation of plasma composition and temperature on a one-dimensional domain located on the plasma axis. The use of this model to analyse the transport phenomena and the chemical process in diamond deposition plasmas is illustrated. The model is also utilized to analyse pulsed mode discharges and the benefit they can bring as far as diamond growth rate and quality enhancement are concerned. We, in particular, show how the model can be employed to optimize the pulse waveform in order to improve the deposition process. Illustrations on how the model can give estimates of the species density at the growing substrate surface over a wide domain of deposition conditions are also given. This brings us to discuss the implication of the model prediction in terms of diamond growth rate and quality.

show abstract

Section: Em Model For Mw Cavity Dischargesmentioning

confidence: 99%

Section: Em Model For Mw Cavity Dischargesmentioning

confidence: 99%

Modelling of diamond deposition microwave cavity generated plasmas

Hassouni¹,

Silva²,

Gicquel³

2010

J. Phys. D: Appl. Phys.

114

View full text Add to dashboard Cite

show abstract

“…Figure 6 shows the structure of TM 0mn modes with the m index ranging from 1 to 3, and for the n index varying from 0 to 3. The modes surrounded by a red dashed line have been used for the design of various reactors [9,[14][15][16][17][18][19][20][21][22], some of which will be described below.…”

Section: Basic Principles Of Mw Plasma Reactors Based On Resonant Cav...mentioning

confidence: 99%

Microwave engineering of plasma-assisted CVD reactors for diamond deposition

Silva¹,

Hassouni²,

Bonnin³

et al. 2009

J. Phys.: Condens. Matter

116

View full text Add to dashboard Cite

The unique properties of CVD diamond make it a compelling choice for high power electronics. In order to achieve industrial use of CVD diamond, one must simultaneously obtain an excellent control of the film purity, very low defect content and a sufficiently rapid growth rate. Currently, only microwave plasma-assisted chemical vapour deposition (MPACVD) processes making use of resonant cavity systems provide enough atomic hydrogen to satisfy these requirements. We show in this paper that the use of high microwave power density (MWPD) plasmas is necessary to promote atomic hydrogen concentrations that are high enough to ensure the deposition of high purity diamond films at large growth rates. Moreover, the deposition of homogeneous films on large surfaces calls for the production of plasma with appropriate shapes and large volumes. The production of such plasmas needs generating a fairly high electric field over extended regions and requires a careful design of the MW coupling system, especially the cavity. As far as MW coupling efficiency is concerned, the presence of a plasma load represents a mismatching perturbation to the cavity. This perturbation is especially important at high MWPD where the reflected fraction of the input power may be quite high. This mismatch can lead to a pronounced heating of the reactor walls. It must therefore be taken into account from the very beginning of the reactor design. This requires the implementation of plasma modelling tools coupled to detailed electromagnetic simulations. This is discussed in section 3. We also briefly discuss the operating principles of the main commercial plasma reactors before introducing the reactor design methodology we have developed. Modelling results for a new generation of reactors developed at LIMHP, working at very high power density, will be presented. Lastly, we show that scaling up this type of reactor to lower frequencies (915 MHz) can result in high density plasmas allowing for fast and homogeneous diamond deposition on up to 160 mm diameter surfaces.

show abstract

“…57) A final interesting coating application is as a gas membrane barrier on PET bottles used for drink and foodstuffs. 8,[58][59][60][61] PET is a transparent plastic used in the drinks industry. However, it has a slight permeability to gases and oxygen can oxidise the contents, while CO 2 can escape, leading to a loss of fizz.…”

Section: Some Applications Of Dlcmentioning

confidence: 99%

“…A 50 nm thickness is needed for sufficient barrier. Economics allows a cycle time of $4 s. Allowing 2 s for pumping to a vacuum, this allows 2 s. The industrial process of Sidel 8,58) uses a microwave plasma and C 2 H 2 as the source gas (Fig. 14).…”

Section: Some Applications Of Dlcmentioning

confidence: 99%