1991
DOI: 10.1063/1.349761
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Electron beam emittance growth in thin foils: A betatron function analysis

Abstract: The emittance of an electron beam increases due to multiple scattering when passing through one or more thin foils. The effect of a given foil on a beam’s emittance is dependent on whether the beam is diverging, converging, or at a waist. A method for calculating the growth in emittance using betatron functions is presented. The technique provides a full description of the beam in phase space after a thin scatterer.

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Cited by 15 publications
(10 citation statements)
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“…5(b). The model was based on calculating the electron beam Twiss parameters (α T , β T , γ T ) from the appropriate transport matrices [40]. We followed Ref.…”
mentioning
confidence: 99%
“…5(b). The model was based on calculating the electron beam Twiss parameters (α T , β T , γ T ) from the appropriate transport matrices [40]. We followed Ref.…”
mentioning
confidence: 99%
“…Tungsten is chosen to produce the maximum scatter for its thickness, having a radiation length of 3.5 mm [22]. 25 MeV electrons hitting the mask are scattered by 160 mrad rms [23] producing a 5 cm spot at the downstream screen, much larger than the $6 mm projection of the slits. Thus, the scattered signal is both weak compared to the beamlets, and contributes a small nearly uniform background to the emittance image.…”
Section: Introductionmentioning
confidence: 99%
“…small angle scattering) on e-beams propagating through the plastic tape is estimated. The rms divergence of an e-beam propagating through a thin solid material is calculated using [92], θ rms = 17.5 γmc 2 z X 0 9 8 1 + 1 9 log 10 z X 0 , (5.8) where z is the propagation distance and X 0 = 28.5 cm is the radiation length of a polyester film. When a ∼ 511 MeV (γ = 1,000) e-beam propagates through a tape of 35 µm thick (25 µm thick tape placed at 45 ≡ ), the scattering angle is θ rms 247 µmrad.…”
Section: Electron Beam Interaction With Plasma Mirrormentioning
confidence: 99%