1979
DOI: 10.1016/0040-6090(79)90524-8
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Electron beam evaporation of low vapor pressure elements in MCrAl coating compositions

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Cited by 15 publications
(3 citation statements)
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“…5 Because of these complex interactions in the pool and the vapour, elements with widely differing vapour pressures can be evaporated simultaneously. 27 However, at present factors such as pool temperature and distribution effectively restrict the evaporation of some elements with low vapour pressures, such as hafnium and tantalum, from a single source.…”
Section: Use Of Rotated Substratementioning
confidence: 99%
“…5 Because of these complex interactions in the pool and the vapour, elements with widely differing vapour pressures can be evaporated simultaneously. 27 However, at present factors such as pool temperature and distribution effectively restrict the evaporation of some elements with low vapour pressures, such as hafnium and tantalum, from a single source.…”
Section: Use Of Rotated Substratementioning
confidence: 99%
“…Therefore, to coat engine components of advanced fighter aircrafts, EB-PVD method is used. 11 Nevertheless, one of the short comings of this method is non-uniformity of vapour composition in evaporation of multi-component materials that leads to non-uniformity of the chemical compositions of coatings. The generated non-uniformity is due to the differences in the vapour pressures of the components.…”
Section: Introductionmentioning
confidence: 99%
“…The occurrence of pegging of the scale at the scale-metal interface increases the erosion resistance of the scale, particularly the Hf and Y active element additions.3. Ti and Si additions formed a smooth contact between the scale and the metal and were associated with a higher erosion rate 4…”
mentioning
confidence: 99%