Electron beam lithography on cylindrical roller

Tseng, Shih Chun; Peng, Wen Yang; Hsieh, Yi Fan; Lee, Ping Jen; Lai, Wen Lang

doi:10.1016/j.mee.2009.11.156

Cited by 16 publications

(10 citation statements)

References 16 publications

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“…However, it is practically impossible to expose two beams at 180°; hence, we aim to create a pattern whose period is slightly greater than half the wavelength. LIL can quickly fabricate both micro and nanopatterns over a relatively large area [18,19,[22][23][24][25][26][27][28][29][30]. In addition, the construction costs for LIL are lower than those for e-beam lithography systems.…”

Section: Introductionmentioning

confidence: 99%

“…Thus, micropatterns and nanopatterns can be quickly produced using the laser interference pattern. Various methods, such as Lloyd's mirror [22,23], beam splitter [18,19,[24][25][26], phase mask [27], and prism-based laser interference [28][29][30] have been investigated. The Lloyd's mirror method performs interference exposure in a basic manner; however, both the interference angle and structure period are fixed in this method.…”

Section: Introductionmentioning

confidence: 99%

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Fabrication System for Large-Area Seamless Nanopatterned Cylinder Mold Using the Spiral Laser Interference Exposure Method

Park

Lee

et al. 2022

Int. J. of Precis. Eng. and Manuf.-Green Tech.

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With the advancement in the field of nanotechnology, nanopatterning finds extensive application not only in high value-added products but also in inexpensive products. In addition, the technology required for the mass production of inexpensive products, such as the continuous roll-to-roll (R2R) process, is rapidly emerging. Extensive research has been conducted on the manufacture of submicron- and nano- molds. In this study, we have proposed a laser interference exposure for fabricating nanopatterned cylindrical molds that can be used in continuous roll-to-roll patterning. Additionally, we have demonstrated spiral exposure process to fabricate a seamless patterning on a cylinder (length of 300 mm and diameter of 100 mm) using a prism. The pattern was transferred to the flat mold using UV resin and measured using a field emission scanning electron microscope; the pattern was measured to have a uniform with nano pattern line width (75 nm) and a sub-micron period (286 nm). It was observed that the proposed method for fabrication of the roll mold using laser interference lithography is a fast and reliable seamless patterning.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Fabrication System for Large-Area Seamless Nanopatterned Cylinder Mold Using the Spiral Laser Interference Exposure Method

Park

Lee

et al. 2022

Int. J. of Precis. Eng. and Manuf.-Green Tech.

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“…Lithography systems for patterning onto cylindrical materials such as pipes, wires, spindles, and rods are especially needed. To answer the requirement, various researches on developing lithography systems for replicating or delineating patterns on cylindrical materials were carried out [1][2][3][4][5][6][7]. The authors also developed laser-scan exposure systems onto fine wires and pipes with diameters of 40-500 µm [8][9][10][11][12][13].…”

Section: Introductionmentioning

confidence: 99%

Lithography onto Surfaces of Fine-Diameter Pipes Using Rotary Scan-Projection Exposure

Horiuchi

Fujii

Yasunaga

2015

J. Photopol. Sci. Technol.

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A new rotary scan-projection exposure system was developed for replicating patterns with widths of around 100 μm. As the first step, a reticle was fixed steady on the reticle stage, and only specimen pipes were rotated. As a result, 100-μm line-and-space (L&S) patterns were successfully replicated on whole circumferences. Deviation 3 σ of the resist pattern widths was as small as 5 μm for the mean width of 100 μm. Next, a reticle with oblique L&S patterns was also scanned synchronously with the rotation of the specimen pipe. However, stitching of patterns doubly exposed at the start and stop parts of rotary exposure was difficult. Although large patterns with widths of 400 μm were successfully replicated on whole surface, 100-μm L&S patterns were replicated only on partial areas of the pipe surface. It was clarified that yaw alignment of the reticle, and alignment between the centers of chucked pipe and the rotation stage should be improved. By working on these subjects, the new system will be graded up further more.

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“…We have developed a method for fabricating nanopatterned roll molds by electron-beam lithography (EBL) with a single point beam that permits the production of a seamless roll mold with high resolution (Taniguchi and Aratani, 2009); similar methods have also been investigated by other researchers (Tseng et al, 2010). In particular, a stencil mask has been used to achieve a high fabrication speed (Abe et al, 2011), but this gave a fabricated pattern with the size of the order of a few hundreds of nanometers with a roll substrate, because the stencil mask caused considerable blurring of the electron beam.…”

mentioning

confidence: 99%

Fabrication characteristics of a line-and-space pattern and a dot pattern on a roll mold by using electron-beam lithography

Ojima

Saito

Unno

et al. 2016

JAMDSM

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IntroductionNanoscale fabrication techniques with a high throughput are needed for the low-cost fabrication of devices of the next generation. One such technique is ultraviolet (UV) nanoimprint lithography (UVNIL) (Haisma et al., 1996), which uses a mold with nanopatterns in conjunction with a UV-curable resin. The process of UVNIL is simple: first, the UV-curable resin is dropped onto a mold and pressed against a transfer substrate. Secondly, the resin is cured by exposure to UV light. Consequently, either the mold or the substrate must be transparent. The mold is then released from the substrate, leaving a duplicate of the nanopattern on the transfer substrate. By means of these simple steps, UVNIL can be used to fabricate nanoscale patterns.Roll-to-roll UVNIL (RTR-UVNIL) (Mikami et al., 1994;Ahn et al., 2006;Ahn and Guo, 2008), in which a roll mold is used, has the potential for even greater throughput, because in RTR-UVNIL, the nanopattern can be transferred continuously at high speeds; for example, Yoshikawa et al. (2013) achieved a speed of 18 m/min. Furthermore, the force necessary to release the mold from the substrate in the RTR-UVNIL process is smaller than that in a planar NIL process; furthermore, the roll mold is in linear contact with the substrate, whereas large-scale planar NIL processes require high pressures and heavy machinery. Patterns on large areas can therefore be produced more efficiently by RTR-UVNIL. However, difficulties exist in the fabrication of roll molds.A roll mold for RTR-UVNIL is typically prepared by attaching planar replica molds onto a roll substrate. This produces a roll mold with seams that reduce the yield of the product. A seamless roll mold can be fabricated by mechanical or laser cutting (Sekkat and Kawata, 2014), but it is difficult to achieve a resolution of less than 100 nm. Self-organized structures, such as those produced by anodic oxidation of aluminum (Masuda et al., 1997), have no seams, and fine pattern sizes can be fabricated by these techniques; however, it is difficult to produce patterns with a Abstract Roll-to-roll nanoimprint lithography (RTR-NIL) has received considerable attention because it permits large-area nanopatterning with both high resolution and high throughput. However, the application of RTR-NIL is restricted by difficulties in fabricating nanoscale roll molds. Seamless roll molds are especially desirable, because the presence of seams reduces the yield of the imprinted product. We have previously developed a technique producing seamless molds by direct writing with an electron beam onto a rotating cylindrical substrate. We have now developed a method for fabricating fine patterns on roll molds for RTR-NIL by using electron-beam lithography (EBL) with a positive-type electron-beam resist and an aluminum roll as a substrate, which is rotated in a scanning electron microscope. The electron beam is focused at a single point on the surface of the roll mold and the dot pattern is produced by switching the beam on and off. Dot and line-and-space p...

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Electron beam lithography on cylindrical roller

Cited by 16 publications

References 16 publications

Fabrication System for Large-Area Seamless Nanopatterned Cylinder Mold Using the Spiral Laser Interference Exposure Method

Fabrication System for Large-Area Seamless Nanopatterned Cylinder Mold Using the Spiral Laser Interference Exposure Method

Lithography onto Surfaces of Fine-Diameter Pipes Using Rotary Scan-Projection Exposure

Fabrication characteristics of a line-and-space pattern and a dot pattern on a roll mold by using electron-beam lithography

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