2006
DOI: 10.1116/1.2186653
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Electron cyclotron resonance plasma assisted pulsed laser deposition for compound host film synthesis and in situ doping

Abstract: We developed a method for compound host film synthesis and in situ doping based on plasma assisted pulsed laser deposition by coablation of two targets with two pulsed laser beams. The feasibility of this method was demonstrated by the preparation of Er-doped GaN films. In the reactive nitrogen environment and with the assistance of nitrogen plasma generated from electron cyclotron resonance microwave discharge, the ablation of a polycrystalline GaAs target resulted in the reactive deposition of a GaN host fil… Show more

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Cited by 3 publications
(1 citation statement)
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“…Such a plasma offers several merits in plasma processing for materials synthesis and fabrication. 11,12 For the purposes of this paper, we have focused our attention on the formation of diatomic molecular radicals C 2 and CN in a hybrid nitrogen-carbon plasma resulted during the expansion of the carbon plume induced by ablating a graphite target in the nitrogen plasma generated by ECR discharge of N 2 gas. C 2 and CN species are particularly important for the synthesis of various carbon nanostructures, such as fullerenes, carbon nanotubes, and carbon nitride nanocones, and can act as building units for such nanomaterials.…”
Section: Introductionmentioning
confidence: 99%
“…Such a plasma offers several merits in plasma processing for materials synthesis and fabrication. 11,12 For the purposes of this paper, we have focused our attention on the formation of diatomic molecular radicals C 2 and CN in a hybrid nitrogen-carbon plasma resulted during the expansion of the carbon plume induced by ablating a graphite target in the nitrogen plasma generated by ECR discharge of N 2 gas. C 2 and CN species are particularly important for the synthesis of various carbon nanostructures, such as fullerenes, carbon nanotubes, and carbon nitride nanocones, and can act as building units for such nanomaterials.…”
Section: Introductionmentioning
confidence: 99%