The observation of electron emission from amorphous carbon thin films at low applied electric fields is explained in terms of an enhancement of the field brought about by dielectric inhomogeneities within the film. These inhomogeneities originate from the differences between conductive, spatially localized sp 2 C clusters surrounded by a more insulating sp 3 matrix. By a more complete understanding of the concentration and distribution of the clusters, a generic model for field emission from amorphous carbon thin films can be developed. Extensions of this model to explain the emission properties of carbon nanotubes and carbon nanocomposite materials are also presented. The possible use of amorphous carbon (a-C) and hydrogenated amorphous carbon (a-C:H) based materials as cold cathodes has now been well documented.1,2 To date there have been numerous reports of field emission ͑FE͒ at low macroscopic electric fields from a range of a-C and a-C:H based materials. [1][2][3][4] In the case of emission from diamondlike carbon ͑DLC͒ films it has been reported that, the main barrier which controls emission may lie at the front film/ vacuum interface.3 By contrast, for low defect density polymeric-like carbon ͑PAC͒ a-C:H films the presence of a heterojunction at the a-C:H/Si rear contact, resulting in hot electron transport through the film has been proposed. 4 This model was used to explain the observed strong dependence of the threshold field (E th ) with film thickness. 5 Although the different types of film possess different physical properties and emission has been explained by different mechanisms, it has been observed that emission is often highly nonuniform across the film surface.3,4,6 One of the major problems hindering the development of thin film carbon cathodes is the lack of understanding of a definitive mechanism for emission at low applied fields, typically Ͻ20 V/m. [3][4][5][6][7] Emission from flat metal surfaces often requires fields in excess of 500 V/m, 2 whereas previous atomic force microscopy ͑AFM͒ studies of a-C and a-C:H films have indicated that the films possess rms roughnesses of less than 1 nm, [1][2][3][4] along with no evidence of surface protrusions which can act as a source of geometric field enhancement. Two recent studies by Ilie et al. 8 and Carey et al. 9 have proposed that it is the sp 2 C cluster size and concentration that play an important role in the FE process. In the study by Ilie, an optimum cluster size for emission of 1.5-2 nm was proposed. Carey showed that for a-C:H films deposited at different selfbiases, the FE could be explained in terms of the connectivity between sp 2 clusters. In this letter, we examine whether there is any dependence of E th with thickness for DLC films and compare these results to the behavior reported 5 for PAC films. Scanning tunneling microscope ͑STM͒ images of the DLC films, show that while the films may be atomically smooth they do exhibit variations in their conductivity, which are attributed to dielectric inhomogeneities within the film. ...