2009
DOI: 10.1063/1.3204670
|View full text |Cite
|
Sign up to set email alerts
|

Electron Hall mobility in GaAsBi

Abstract: We present measurements of the electron Hall mobility in n-type GaAs1−xBix epilayers. We observed no significant degradation in the electron mobility with Bi incorporation in GaAs, up to a concentration of 1.2%. At higher Bi concentration (≥1.6%) some degradation of the electron mobility was observed, although there is no apparent trend. Temperature dependent Hall measurements of the electron mobility suggest neutral impurity scattering to be the dominant scattering mechanism.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

6
53
0

Year Published

2010
2010
2022
2022

Publication Types

Select...
7
1
1

Relationship

1
8

Authors

Journals

citations
Cited by 99 publications
(59 citation statements)
references
References 16 publications
6
53
0
Order By: Relevance
“…Electron mobility of GaAsBi does not show significant degradation with Bi alloying [50,51,220,221], which is the opposite of the case of N incorporation in GaAs where the electron mobility is significantly degraded due to strong carrier scattering at the localized states formed by isolated N and N-clusters [222,223]. Bismuth incorporation causes degradation of hole mobility in GaAs.…”
Section: Transport Propertiesmentioning
confidence: 78%
See 1 more Smart Citation
“…Electron mobility of GaAsBi does not show significant degradation with Bi alloying [50,51,220,221], which is the opposite of the case of N incorporation in GaAs where the electron mobility is significantly degraded due to strong carrier scattering at the localized states formed by isolated N and N-clusters [222,223]. Bismuth incorporation causes degradation of hole mobility in GaAs.…”
Section: Transport Propertiesmentioning
confidence: 78%
“…When both N and Bi are used, it is possible to independently control CB and VB in GaAsNBi, and thus extend light emission wavelength very efficiently. Other beneficial properties when using Bi include large spin-orbit (SO) split band [46,47], less temperature sensitive bandgap [32,48,49], minor influence on both electron [50] and hole mobility [51] for small Bi concentrations, enhancement of PL intensity [44] and surfactant effect ensuring smooth surface [52], etc. Sweeney and Jin proposed theoretically that GaAsNBi is promising for efficient near IR light emitting devices [53].…”
Section: Theoretical Predictionmentioning
confidence: 99%
“…A 250-nm thick GaAs buffer layer was grown on the substrates before growing the GaAs 1-x Bi x epilayers. More details about the growth can be found in Ref [20]. We have also studied a heterostructure sample, in which a 100 nm AlAs layer was grown between the GaAs buffer layer and the 300 nm GaAs 1-x Bi x epilayer.…”
Section: Methodsmentioning
confidence: 99%
“…It has been found to be in the range from 2000 cm 2 /Vs to 2800 cm 2 /Vsmuch larger than the electron mobility in LTG GaAs and in diluted GaNAs alloys. Slightly lower electron mobilities were obtained from the Hall-effect measurement on heavily n-doped GaBiAs [128].…”
Section: Gabiasmentioning
confidence: 99%