1975
DOI: 10.1103/physrevlett.35.1522
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Electron-Hole-Pair Creation Energies in Semiconductors

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Cited by 228 publications
(165 citation statements)
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“…Our calculated values listed in Table 1 compare well with the empirical expectation E eh ≈ 3E gap . 55 For alkali iodides, because of the wide band gap and the comparatively narrow valence band widths, a hole in the valence has low probability for scattering and creating SEs. 56,57 Thus, the neglect of holes in our treatment is to some extent justified.…”
Section: Resultsmentioning
confidence: 99%
“…Our calculated values listed in Table 1 compare well with the empirical expectation E eh ≈ 3E gap . 55 For alkali iodides, because of the wide band gap and the comparatively narrow valence band widths, a hole in the valence has low probability for scattering and creating SEs. 56,57 Thus, the neglect of holes in our treatment is to some extent justified.…”
Section: Resultsmentioning
confidence: 99%
“…In most experimental studies, carrier multiplication energy threshold E CM has been observed as significantly higher than naivelyexpected 2E g . This phenomenon is even more prominent in bulk semiconductors, where E CM ~ 4E g provided electron effective mass m e ~ hole effective mass m h [73,74], due to the requirement of energy and momentum conservation among carriers involved in impact ionization. Successful E CM reduction down to ~2E g however has been recently observed utilizing momentum spread and small m e /m h ratio in InAs QDs [71].…”
Section: Utilization Of Higher Energy Photonsmentioning
confidence: 99%
“…In an analogous process to that described above for ion chambers, absorption of a photon in a silicon crystal creates separations of charge, which are called electron-hole pairs and require an average energy, ", of 3.66 AE 0.03 eV (Alig & Bloom, 1975;Scholze et al, 2000) for generation. Physically, electrons and holes are charged electronic excited states of atoms in the crystal lattice, which move under the influence of electric fields, such as that caused by the difference in chemical potential between the p (boron or aluminium doped) and n (phosphorus, arsenic or antimony doped) layers, resulting in the flow of an electric current.…”
Section: Silicon Pin Diodesmentioning
confidence: 99%