1992
DOI: 10.1103/physrevlett.68.329
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Electron interferometry at a metal-semiconductor interface

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Cited by 46 publications
(11 citation statements)
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“…13,14 In recent years, the primary use of z(V) spectroscopy has been to study barrier resonances for the purpose of characterizing local surface potential variations. It has been applied to ultrathin insulating films, 15,16 small organic molecules, 17,18 semiconductors, 19 fullerenes, 20,21 and graphene. 22,23 The basic z(V) measurement is very simple, as illustrated schematically in Fig.…”
Section: Introductionmentioning
confidence: 99%
“…13,14 In recent years, the primary use of z(V) spectroscopy has been to study barrier resonances for the purpose of characterizing local surface potential variations. It has been applied to ultrathin insulating films, 15,16 small organic molecules, 17,18 semiconductors, 19 fullerenes, 20,21 and graphene. 22,23 The basic z(V) measurement is very simple, as illustrated schematically in Fig.…”
Section: Introductionmentioning
confidence: 99%
“…The resulting modulation patterns were ascribed to interference between scattered electrons at the boundaries of the nanostructures (Heller et al, 1994;Fiete and Heller, 2003). STM and STS can also detect electronic states confined in a direction perpendicular to the surface, in thin films (Kubby and Greene, 1992;Becker and Berndt, 2010) and nanostructures (Altfeder, Matveev, and Chen, 1997;Yang et al, 2009), where the motion of electrons is confined by the surface and the interface with substrates.…”
mentioning
confidence: 99%
“…It has been demonstrated some time ago that the relief of a semiconductor surface buried under a thin metallic film can be imaged with STM by using electron interferometry. [5][6][7] For metal/ semiconductor systems, the surface LDOS is dominated by the evanescent part of transverse quantized states which develop in the metallic overlayer. As the energy of the bulk resonances depends on the local thickness of the film, spatial variations of the surface LDOS can be evidenced by imaging at a proper voltage and related to the buried relief.…”
mentioning
confidence: 99%
“…As the energy of the bulk resonances depends on the local thickness of the film, spatial variations of the surface LDOS can be evidenced by imaging at a proper voltage and related to the buried relief. Originally the method was proposed by Kubby et al 5 to investigate the Ni/ Si͑111͒ interface and silicide formation by mapping the tunnel conductance which is almost proportional to the density of states at the surface. A few years later Altfeder et al have been able to image the step edges of a Si͑111͒ substrate buried under thick ͑ϳ100 Å͒ Pb islands by simply recording constant current images at small gap voltage ͑few millivolts͒.…”
mentioning
confidence: 99%