1986
DOI: 10.1007/bf02744158
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Electron microscopy study of chemically deposited Ni-P films

Abstract: The structure ofele~troless thin films of NiP has been studied. The microstructare and the selected area diffraction pattern of the samples reveal that certain samples transform to crystalline Ni with P in solid solution by nucleation and growth, whereas others transform to crystalline state by growth alone. The former set of thin films having a P-content of 19-21 at. To is character~ed as amorphous. Films with a P-content of 13-15 at. ~o fall in the latler category and are characterized as microcrystalline. T… Show more

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Cited by 7 publications
(2 citation statements)
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“…On the other hand, high phosphorus deposits seemed continuous and amorphous. Kreye et al [8] and Zhang et al [9] described electroless nickel coatings with very low phosphorus content as equiaxed and nanocrystalline, while Yamasaki et al [10], Tyagi et al [11] and Hur et al [12], concluded that low phosphorus deposits are crystalline, containing a supersaturated solid solution of phosphorus in the nickel lattice. X-ray diffraction patterns obtained from electroless nickel deposits are known to change with heat treatment as it involves change in microstructure of the nickel matrix [13].…”
Section: Introductionmentioning
confidence: 98%
“…On the other hand, high phosphorus deposits seemed continuous and amorphous. Kreye et al [8] and Zhang et al [9] described electroless nickel coatings with very low phosphorus content as equiaxed and nanocrystalline, while Yamasaki et al [10], Tyagi et al [11] and Hur et al [12], concluded that low phosphorus deposits are crystalline, containing a supersaturated solid solution of phosphorus in the nickel lattice. X-ray diffraction patterns obtained from electroless nickel deposits are known to change with heat treatment as it involves change in microstructure of the nickel matrix [13].…”
Section: Introductionmentioning
confidence: 98%
“…Additionally, the hardness level attained after annealing at these temperatures (~13.0 GPa) is substantially above that reported for other metal-metalloid deposits such as electroless and electroplated Ni-P coatings, which generally exhibit maximum hardness values of at most~8.8 GPa at substantially lower annealing temperatures (T < 500°C). [16][17][18][19][20][21][22] This strength enhancement after annealing suggests that ternary Cr-C-P coatings may find use in applications Fig. 4.-Effect of annealing temperature and phosphorus content on hardness of electrodeposited Cr-C-P coatings.…”
mentioning
confidence: 98%