Titanium nitride is a material of interest for many superconducting devices such as nanowire microwave resonators and photondetectors. Thus, controlling the growth of TiN thin films with desirable properties is of high importance. This work aims toexplore effects in ion beam-assisted sputtering (IBAS), which has reduced nitrogen sensitivity during deposition in tandemwith an increase in nominal critical temperature and upper critical fields in previous work on Niobium nitride (NbN). We growthin films of titanium nitride by both, the conventional method of DC reactive magnetron sputtering and the IBAS method, tocompare their superconducting critical temperatures Tc as functions of thickness, sheet resistance, and nitrogen flow rate.We perform electrical and structural characterizations by electric transport and x-ray diffraction measurements. Comparedto the conventional method of reactive sputtering, the IBAS technique has demonstrated a 10% increase in nominal criticaltemperature and 33% reduced sensitivity to nitrogen flow, without noticeable variation in the lattice structure. Additionally, weexplore the behavior of superconducting Tc in ultra-thin films. Trends in films grown at high nitrogen concentrations followpredictions of mean-field theory in disordered films and show suppression of superconducting Tc due to geometric effects,while nitride films grown at low nitrogen concentrations strongly deviate from the theoretical models.