1996
DOI: 10.12693/aphyspola.90.691
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Electron Transport in Submicron Wires of Semiconductors

Abstract: We review the methods of fabrication and transport properties of submicron II-VI, IV-VI and IlI-V semiconductor wires. Devices were prepared by electron-beam lithograply and used for detailed magnetotransport studies, carried out at low (down to 30 mK) temperatures. We discuss a number of novel features obtained in ballistic, diffusive and localized transport regimes. Iń particular, we describe the universal conductance fluctuations for semimagnetic materials (CdMnTe) and discuss the edge channel transport for… Show more

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Cited by 4 publications
(6 citation statements)
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References 23 publications
(35 reference statements)
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“…Surprisingly, however, there have been experimental data obtained by our group some time ago, showing pronounced nonlocal resistances and reproducible magnetoresistance fluctuations in microstructures of PbTe and PbSe epilayers deposited on BaF 2 substrates (see Fig. 1) [31,32]. Similar effects were also reported by others for wide quantum wells of PbTe [33].…”
supporting
confidence: 84%
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“…Surprisingly, however, there have been experimental data obtained by our group some time ago, showing pronounced nonlocal resistances and reproducible magnetoresistance fluctuations in microstructures of PbTe and PbSe epilayers deposited on BaF 2 substrates (see Fig. 1) [31,32]. Similar effects were also reported by others for wide quantum wells of PbTe [33].…”
supporting
confidence: 84%
“…In the first part of this work we present results of new careful transport measurements carried out on the previously [31,32] studied PbTe epilayers. Our findings demonstrate that the nonlocal resistance does not result from the edge channel transport, but originates from the presence of an additional conducting layer brought about by threading dislocations and/or the doping by the substrate material, in the interfacial region of the epilayers adjacent to the lattice mismatched BaF 2 substrate.…”
Section: Introductionmentioning
confidence: 99%
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“…Wires are fabricated by means of 30 keV e-beam lithography [5], followed by wet etching in 0.5% solution of Br 2 in ethylene glycol. Precise atomic force microscope (AFM) measurements showed their cross-section of side 0.3 m.…”
mentioning
confidence: 99%