Electronic and crystal structure and bonding in Ti-based ternary solid solution nitrides and Ti–Cu–N nanocomposite films

Patsalas, P.; Abadias, G.; Matenoglou, Grigorios; Κουτσοκέρας, Λουκάς; Lekka, Ch.E.

doi:10.1016/j.surfcoat.2010.09.024

Cited by 36 publications

(6 citation statements)

References 75 publications

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“…A major challenge in materials science is to develop not only hard but also tough coatings, in order to prevent brittle failure when these materials are solicited by external stresses. Predicting ductility versus brittleness is a non-trivial task for TMN as these materials exhibit a combination of metallic, ionic and covalent bonding [21][22][23]. Therefore, the response to plastic deformation is intimately related to their electronic structure.…”

Section: Introductionmentioning

confidence: 99%

Alloying effects on the structure and elastic properties of hard coatings based on ternary transition metal (M = Ti, Zr or Ta) nitrides

Abadias

Djémia

Belliard

2014

Surface and Coatings Technology

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Section: Introductionmentioning

confidence: 99%

Alloying effects on the structure and elastic properties of hard coatings based on ternary transition metal (M = Ti, Zr or Ta) nitrides

Abadias

Djémia

Belliard

2014

Surface and Coatings Technology

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“…Surprisingly, in the high frequency region (>1000 cm −1 ) there is a clear contribution of carbonaceous residues, not in the form of PS (Figure 6, gray line reproduced from Reynolds and Hsu [ 76 ] ) but in the form of amorphous carbon with the distinct well‐known D and G bands, [ 77,78 ] which is also confirmed by scanning Auger microscopy with a resolution of 0.6 μm using a field emission gun (see Figure S2, Supporting Information). AES also confirmed the successful formation of TiN by evaluating the Ti LMM /Ti LMV peak intensity ratio according to Patsalas et al [ 79 ] Based on the observed G band frequencies (1585 and 1595 cm −1 ) and the intensity ratio of I D / I G (≈0.7 and ≈0.5 for the spots i and ii, respectively), it appears that the carbonaceous residues are compatible with the presence of hydrogenated amorphous carbon after the annealing step that caused desorption of hydrogen and graphitization of carbon. [ 77 ] The results indicate that there were PS residues after liftoff that were graphitized and attached to the substrate instead of being desorbed during vacuum annealing.…”

Section: Resultsmentioning

confidence: 61%

Etchless Fabrication of High‐Quality Refractory Titanium Nitride Nanostructures

Panos

Tselekidou

Kassavetis

et al. 2021

Physica Status Solidi (b)

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Nanosphere lithography has emerged as an efficient route to produce plasmonic nanostructures. Herein, the processes of nanosphere lithography and reactive magnetron sputtering that seem incompatible for a variety of reasons are reviewed and explained. However, understanding the physical obstacles of this combination enables us to identify a window of process parameters that make the deposition of well‐defined trigonal nanoislands of titanium nitride (TiN) feasible. TiN is used as a case study because it is a very good representative of refractory conductive nitrides, such as ZrN, HfN, NbN, and TaN. A UV ozone step is used to confine the triple‐junction vias of the polystyrene mask, and the reactive magnetron sputtering parameters are fine‐tuned to increase the directionality of deposited species, in particular the substrate‐to‐target distance is maximized to improve geometrical directionality, and a negative bias voltage is used to guide the ionic species deep into the vias. The proposed process produces well‐defined TiN nanoislands with low concentration of point defects that have similar structure with continuous films of high electrical conductivity and plasmonic performance.

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“…Beyond the strong 200 peak, the spectrum contains also the 111, 220, 311 and 222 peaks of lower intensity indicating that, beside the pronounced 〈001〉 texture, randomly oriented crystals are also present in the film. [25,26]. The pole figure taken by the 002 reflection (not shown) proved that the axis of the 〈001〉 texture is perpendicular to the substrate surface plane.…”

Section: X-ray Diffraction Analysismentioning

confidence: 92%

Crossover of texture and morphology in (Ti1−xAlx)1−yYyN alloy films and the pathway of structure evolution

Székely

Sáfrán

Kis

et al. 2014

Surface and Coatings Technology

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In our earlier published work, we have shown that there is a composition range of the (Ti 1 − x Al x ) 1 − y Y y N alloy films (0.72 b Ti/Al b 0.88) deposited at oblique vapour beam incidence and 500°C (corresponding to zone T) in which mixed cubic TiN (c-TiN) and wurtzite AlN (w-AlN) structures were formed together with an unusual complex texture. The texture of c-TiN phase changed from 〈001〉 to b111N at a certain thickness forming a definite crossover. Moreover the c-TiNb111N and the w-AlN〈0001〉 crystals were epitaxially related with axes tilted to the direction of the vapour beam. Based on a comprehensive transmission electron microscopy (TEM) and diffraction (XRD and selected area electron diffraction (SAED)) structure and morphology analysis, we discovered the details of this exotic structure making it possible to construct the complex pathway of structure evolution including the formation of the w-AlN phase and the change of the dominating texture of c-TiN phase with thickness in dependence of the Ti/Al ratio and the deposition parameters. This pathway could be deduced from the fundamental phenomena of structure formation and may be generalised for multi-component thin film systems. A composition structure zone model has been also proposed for the (Ti 1 − x Al x ) 1 − y Y y N thin film system in the 0 b x b 1 composition range.

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Electronic and crystal structure and bonding in Ti-based ternary solid solution nitrides and Ti–Cu–N nanocomposite films

Cited by 36 publications

References 75 publications

Alloying effects on the structure and elastic properties of hard coatings based on ternary transition metal (M = Ti, Zr or Ta) nitrides

Alloying effects on the structure and elastic properties of hard coatings based on ternary transition metal (M = Ti, Zr or Ta) nitrides

Etchless Fabrication of High‐Quality Refractory Titanium Nitride Nanostructures

Crossover of texture and morphology in (Ti1−xAlx)1−yYyN alloy films and the pathway of structure evolution

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