Electronic structure and chemical bonding of nanocrystalline-TiC/amorphous-C nanocomposites

Magnuson, Martin; Lewin, Erik; Hultman, Lars; Jansson, Ulf

doi:10.1103/physrevb.80.235108

Cited by 72 publications

(104 citation statements)

References 42 publications

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“…Between these contributions C-Si bonds, at 282.5 eV, are expected. For nanocomposite Ti-C materials additional contributions have also been reported in this region [37,38,39,40,41,42,43,44], which have been associated with several different causes, including ion beam sputtering damage [42], and an interfacial state between nc-TiC and a-C phase [12,40,41,43]. Such contribution can hence not be excluded in the present samples, and is indicated in Figure 4 by TiC*.…”

Section: The Influence Of the Target-to-substrate Distance And Pressurementioning

confidence: 83%

High-rate deposition of amorphous and nanocomposite Ti–Si–C multifunctional coatings

Lauridsen

Eklund

Joelsson

et al. 2010

Surface and Coatings Technology

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2 transport of the species. Increased target-to-substrate distance from 2 cm to 8 cm resulted in a higher carbon-to-titanium ratio in the coatings than for the Ti 3 SiC 2 compound target, due to different gas-phase scattering properties between the sputtered species. The coatings microstructure could be modified from nanocrystalline to predominantly amorphous by changing the pressure and target-to-substrate conditions to 4 mTorr and 2 cm, respectively. A decreased pressure from 10 mTorr to 4 or 2 mTorr at a target-tosubstrate distance of 2 cm decreased the deposition rate up to a factor of ~7 as explained by resputtering and an increase in the plasma sheath thickness. The coatings exhibited electrical resistivity in the range 160-800 µΩcm, contact resistance down to 0.8 mΩ at a contact force of 40 N, and nanoindentation hardness in the range 6-38 GPa.

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Section: The Influence Of the Target-to-substrate Distance And Pressurementioning

confidence: 83%

High-rate deposition of amorphous and nanocomposite Ti–Si–C multifunctional coatings

Lauridsen

Eklund

Joelsson

et al. 2010

Surface and Coatings Technology

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“…Fitting of the C1s spectrum shows that the contribution to the peak at 282.4 eV, denoted C-Si, is not only from C-Si bonds, but probably also from sputtering damage and an interfacial state. The latter has been observed in nanocomposite TiC coatings and is known as TiC* [29,30,31]. (002) planes (see HREM and FFT insets in Figure 5a).…”

Section: Resultsmentioning

confidence: 99%

Microstructure evolution of Ti–Si–C–Ag nanocomposite coatings deposited by DC magnetron sputtering

et al. 2010

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Nanocomposite coatings consisting of Ag and TiC x (x<1) crystallites in a matrix of amorphous SiC were deposited by high-rate magnetron sputtering from Ti-Si-C-Ag compound targets. Different target compositions were used to achieve coatings with a Si content of ~13 at%, while varying the C/Ti ratio and Ag content. Electron microscopy, helium ion microscopy, x-ray photoelectron spectroscopy, and x-ray diffraction were employed to trace the Ag segregation during deposition and possible decomposition of the amorphous SiC. Eutectic interaction between Ag and Si is observed and the Ag forms threading grains that coarsen with increased coating thickness. The coatings can be tailored for conductivity horizontally or vertically, by controlling the shape and

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“…This limited solid solubility can be explained by considering the density-of-states (DOS) for cubic Ti-C [24,25]. With Ti all bonding states are occupied giving a Fermi level just below the nonbonding/antibonding states.…”

Section: Discussionmentioning

confidence: 99%

Control of crystallinity in sputtered Cr–Ti–C films

Furlan

Hultman

et al. 2013

Acta Materialia

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The influence of Ti content on crystallinity and bonding of Cr-Ti-C thin films deposited by magnetron sputtering have been studied by X-ray diffraction, X-ray photoelectron spectroscopy, transmission electron microscopy, and Raman spectroscopy. Our results show that binary Cr-C films without Ti exhibit an amorphous structure with two non-crystalline components;amorphous CrC x and amorphous C (a-C). The addition of 10-20 at% Ti leads to a crystallization of the amorphous CrC x and the formation of a metastable cubic (Cr 1-x Ti x )Cy phase. The observation was explained based on the tendency for formation of crystalline carbide films among the 3d transition metals. The mechanical properties of the films determined by nanoindentation and microindentation were found to be strongly dependent on the film composition in terms of hardness, elasticity modulus, H/E ratio, and crack development.

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Electronic structure and chemical bonding of nanocrystalline-TiC/amorphous-C nanocomposites

Cited by 72 publications

References 42 publications

High-rate deposition of amorphous and nanocomposite Ti–Si–C multifunctional coatings

High-rate deposition of amorphous and nanocomposite Ti–Si–C multifunctional coatings

Microstructure evolution of Ti–Si–C–Ag nanocomposite coatings deposited by DC magnetron sputtering

Control of crystallinity in sputtered Cr–Ti–C films

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